The 4th International Conference on ALD Applications & 2018 China ALD Conference

[www.c-ald.com] This week the 4th International Conference on ALD Applications & 2018 China ALD Conference was held  in Shenzhen, China, from October 14 to 17, 2018.

The four-day meeting was dedicated to the fundamentals and applications of Atomic Layer Deposition (ALD) technology in various fields.This conference will feature plenary sessions, oral sessions, poster sessions and industrial exhibitions.

PROCEEDING AND FULL PAPER:

Full contributed papers will be peer reviewed and published in a special issue Nanoscale Research Letters ((2018 impact factor: 3.125) https://nanoscalereslett.springeropen.com/aald

First oral presentation about #ruthenium #ALDep by mu PhD student @thangnguyenchi at China #ALDep conference. Great job! pic.twitter.com/RLY5WQdz13

— Han-Bo-Ram Lee (@HanBoRam_Lee) October 15, 2018

Invited talk about #superhydrophobic #coating by #ALDep at China #ALDep conference pic.twitter.com/u98s4z5yJT

— Han-Bo-Ram Lee (@HanBoRam_Lee) October 15, 2018

#HelsinkiALD alumni Wei-Min Li making impact with world's largest ALD tool, crazy throughput! In China ALD in Shenzhen. pic.twitter.com/215047nEc5

— Mikko Ritala (@MikkoRitala) October 17, 2018

Supporting ALD China welcome to Shenzhen, China #ald #chinald #bubblers #ampoules #levelsensors pic.twitter.com/3kpeoO2EZZ

— kyle kimmerle (@pdxguy2009) October 15, 2018