The ALD Lab Saxony just held its annual Symposium at SEMICON Europe
in Munich, Germany. Prof. Bartha, Dr. Jonas Sundqvist, Dr. Martin Knaut
and Dr. Christoph Hossbach have been organizing the event since 2012 in
Dresden. This year about 50 persons attended the symposium.
The Intention of the Symposium is to improve visibility of the Atomic
Layer Deposition technique and its capabilities and to increase the
networking within the ALD community. The given talks gave an overview of
current research and development topics as well as examples of ALD
applications, equipment, chemical and supply chain in manufacturing.
This year’s agenda combined several talks from ALD Lab Saxony members
and partners from academia and industry on ALD equipment, applications,
metrology as well as ALD simulations. This year the symposium was
divided into two sessions: “Equipment and Applications” and “Precursors,
Precursor Delivery, Metrology and Simulations”
New exciting applications in the field of MEMS were presented by
Fraunhofer ISIT, ALD corrosion protection by Bosch and metal precursor
sourcing and supply chain solutions by Umicore to mention a few. The
complete Agenda can be found here (LINK: http://www.semiconeuropa.org/ald-lab-symposium-2017) and upon request the presentations will become available.
“ALD equipment and precursors for high volume manufacturing”, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany) /TECHCET LLC (USA)
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