Monday, November 17, 2014

SENTECH presents Real Time Monitor at ALD China Conference

SENTECH Instruments GmbH of Berlin, Germany, which manufactures equipment for plasma etching and deposition, atomic layer deposition (ALD) and thin-film measurements, has presented its new ALD Real Time Monitor in Asia at the 3rd China ALD Conference in Shanghai (16-17 October). 

For the first time the patented monitor allows the direct monitoring of absorption and desorption processes on the substrate surface during ALD processes within ALD half cycles.

Sentech PEALD system - The system can be equipped with several in-situ diagnostics tools e. g. QCM, QMS, ellipsometer. Ultra-fast in-situ ellipsometers are offered for monitoring layer-by-layer film growth applying laser ellipsometry as well as wide range spectroscopic ellipsometry

“Using the ALD Real Time Monitor enables efficient and fast process optimization,” says Dr Gargouri, SENTECH’s specialist for ALD processes, who gave a speech during the conference.


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