Call for Abstracts - ALD 2015: June 28-July 1, Portland, Oregon

Call for Abstracts - ALD 2015: June 28-July 1, Portland, Oregon

 

Abstract Deadline: February 16, 2015

The conference will cover a wide range of topics including the following. Prospective authors are invited to Submit Online

 

ALD FUNDAMENTALS:

Precursors and Chemistry

• Precursor Design, New Precursors, Recipe Development
• Simulation, Modeling, and Theory of ALD
• Precursor Delivery Systems

Growth and Characterization

• In-situ Monitoring and Analysis
• ALD Surface Chemistry and Initiation of Growth
• Surface Preparation for ALD
• Characterization of ALD Coatings
• Highly Conformal ALD Processes
• Plasma Enhanced ALD Processes
• Electrochemical (EC) ALD Processes

Novel Materials

• Molecular Layer Deposition
• Organic-Inorganic Hybrid Materials
• Atomic Layer Epitaxy and Doping
• Magnetic Materials
• ALD Coating of Powder

NANOSTRUCTURE SYNTHESIS AND FABRICATION:

• Selective ALD Growth, Patterning
• Nanotubes, Nanowires, Nanopores
• Nanoparticles
• Nanolaminates 2D Nanomaterials (Including Transition Metal Dichalcogenides)

ALD APPLICATIONS:

• Energy
• Catalysis and Fuel Cells
• Solar Energy Materials
• Batteries and Energy Storage

Applications in ULSI FEOL and BEOL

• High-k Applications
• Gate Electrode
• Contact Metal
• 3D Transistor Fabrication
• Interconnects
• Cu Diffusion Barriers
• Cu Capping Technologies
• Low-k Pore Sealing
• Low-k Spacer

Memory Applications

• DRAM
• Flash Memory
• MRAM
• RRAM
• Other Non-volatile Memories

ALD FOR MANUFACTURING

• Reactor and Equipment Design for Manufacturing
• ALD Reactor Modeling
• Large Format ALD
• Spatially Controlled ALD
• Sensing and Process Control
• Fast ALD
• R2R