Thursday, May 20, 2021

ALD/ALE 2021 Technical Program June 27-30, 2021

Virtual Meeting Overview & Highlights

The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be adapted into a Virtual Meeting comprised of Live and On Demand Sessions. The event will feature:

AVS ALD/ALE 2021 Conference Page 

Live Tutorial Session with live Q&A Chat Opportunities
(Sunday, June 27, 2021)

  • Parag Banerjee (University of Central Florida, USA), “Seeing Is Believing: In situ Techniques for Atomic Layer Deposition (ALD) Process Development and Diagnostics”
  • Arrelaine Dameron (Forge Nano, USA), “ALD Powder Manufacturing”
  • Henrik Pedersen (Linkoping University, Sweden), “Let’s Talk Dirty – Battling Impurities in ALD Films”
  • Riikka Puurunen (Aalto University, Finland), “Fundamentals of Atomic Layer Deposition: An Introduction (“ALD 101”)”
  • Fred Roozeboom (Eindhoven University of Technology, The Netherlands), “ALE and ALD: Two Biotopes of a Kind in Atomic-Scale Processing”

Live Plenary, Awards, and Student Finalists with live Q&A Chat Opportunities (Monday, June 28, 2021)

  • Plenary Speaker: Steven George (University of Colorado Boulder, USA), “Mechanisms of Thermal Atomic Layer Etching”
  • Plenary Speaker: Todd Younkin (Semiconductor Research Corporation, USA), “Materials & Innovation – Essential Elements that Underpin the Next Industrial Revolution
  • Live Parallel Technical Sessions with live Q&A Chat Opportunities (Tuesday-Wednesday, June 29-30, 2021)

  • On Demand Oral Sessions (Starting Monday, June 28, 2021)

  • On Demand Poster Sessions with a Mix of Pre-recorded (Video or Audio) Talks and/or PDF files

Note: Live and On Demand Sessions available on Mobile App/Online Scheduler through July 31, 2021 and then to AVS members in the AVS Technical Library. Live Sessions will also be recorded and added to the On Demand Sessions.

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