Monday, November 4, 2019

An Integrated Cleanroom Process for the Vapor Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films

Alexander John Cruz, Energy Scientist, and Doctoral Candidate, KU Leuven, Belgium recently published an integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films.
Robust and scalable thin film deposition methods are essential to realizing the potential of metal-organic frameworks (MOFs) in electronic devices. Here is the reporting of the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for ZIF-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions.
The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in-situ monitoring and ex-situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.

Graphical abstract (as shared on Twitter, LINK)

Journal Publication: Chemistry of Materials, Chem. Mater. 2019Publication Date:October 25, 2019

Submitted manuscript available for download at ChemRxiv:

By Abhishekkumar Thakur