Monday, August 6, 2018

Veeco Firebird(TM) - Batch Thermal ALD for High Volume Production

Earlier this year Veeco launched their new platform for Batch ALD for high volume production and now you can find more details on the Veeco product offering pages: LINK

Firebird - Batch ALD for High Volume Production

The Firebird™ system is a fully automated batch production ALD platform delivering superb uniformity with best-in-class throughput at the lowest possible cost-per-wafer. Integrating proven Veeco automation solutions, it enables safe wafer handling via low-impact batch transfer. Its modular pre-heat & cool-down design enables a flexible thermal management solution tailored around your specifications. The Firebird™ system’s high capacity reactor(s), low consumables/maintenance costs and compact footprint deliver the most cost-effective solution while exceeding your throughput requirements.

Firebird™ - ALD System for Specialized Wafer Production 

Key features include:

  • Ideal for oxide films, including encapsulation & barrier layers, optical coating
  • Best-in-class throughput (up to 40,000 wafers per month)
  • Proven Veeco automation
  • Safe wafer handling for fragile / temperature sensitive substrates (e.g., LNO / LTO / glass)
  • Modular thermal management for optimal process flexibility and throughput
  • Worldwide sales, service and support

Configurability advantage

The modular system configuration can be effectively tailored to minimize process flow bottlenecks and offers outstanding processing flexibility.

 2 reactors, 1 heat-up module

1 reactor, 2 heat-up modules