NaMLab invites to the Novel High-k Application Workshop on March 9th and 10th, 2017. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities. One main focus will be on the ferroelectric properties of HfO2.
NaMLab created with the workshop a stimulating platform for application-oriented scientist to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2 were discovered 10 years ago. On the second day of the workshop, root causes for the formation of this so far unknown phase will be discussed.
Registration for the workshop started:
- registration rate: participants: 12€/day - students: 10€/day (includes all meals and coffee breaks)
- registration rate can be paid by credit card, pay pal (Europe only: direct transfer)
Workshop location: Max Planck Institute PKS (Physics of Complex Systems), Noethnitzer Strasse 38