Wednesday, November 5, 2014

Call for Abstracts - ALD 2015: June 28-July 1, Portland, Oregon

Call for Abstracts - ALD 2015: June 28-July 1, Portland, Oregon
 
Abstract Deadline: February 16, 2015
The conference will cover a wide range of topics including the following. Prospective authors are invited to Submit Online
 
ALD FUNDAMENTALS:

Precursors and Chemistry
  • Precursor Design, New Precursors, Recipe Development
  • Simulation, Modeling, and Theory of ALD
  • Precursor Delivery Systems
Growth and Characterization
  • In-situ Monitoring and Analysis
  • ALD Surface Chemistry and Initiation of Growth
  • Surface Preparation for ALD
  • Characterization of ALD Coatings
  • Highly Conformal ALD Processes
  • Plasma Enhanced ALD Processes
  • Electrochemical (EC) ALD Processes
Novel Materials
  • Molecular Layer Deposition
  • Organic-Inorganic Hybrid Materials
  • Atomic Layer Epitaxy and Doping
  • Magnetic Materials
  • ALD Coating of Powder
NANOSTRUCTURE SYNTHESIS AND FABRICATION:
  • Selective ALD Growth, Patterning
  • Nanotubes, Nanowires, Nanopores
  • Nanoparticles
  • Nanolaminates 2D Nanomaterials (Including Transition Metal Dichalcogenides)
ALD APPLICATIONS:
  • Energy
  • Catalysis and Fuel Cells
  • Solar Energy Materials
  • Batteries and Energy Storage
Applications in ULSI FEOL and BEOL
  • High-k Applications
  • Gate Electrode
  • Contact Metal
  • 3D Transistor Fabrication
  • Interconnects
  • Cu Diffusion Barriers
  • Cu Capping Technologies
  • Low-k Pore Sealing
  • Low-k Spacer
Memory Applications
  • DRAM
  • Flash Memory
  • MRAM
  • RRAM
  • Other Non-volatile Memories
ALD FOR MANUFACTURING
  • Reactor and Equipment Design for Manufacturing
  • ALD Reactor Modeling
  • Large Format ALD
  • Spatially Controlled ALD
  • Sensing and Process Control
  • Fast ALD
  • R2R