Thursday, January 30, 2014

JUSUNG ENGINEERING to introduce 'Space Divided Plasma System'

AVING NET reports that JUSUNG ENGINEERING( to introduce its semiconductor product including 'Space Divided Plasma System'(SDP), which features largely three functions which are 'ALD', 'CVD' and 'Treatment' for Nitridation, Oxidation and Doping. The system is capable to go through the process of ordinary PECVD, LPCVD and Defusion Furnishing, which can solve wafer damage problem by plasma.

Image from AVING NET - Jusung SDP - Space Divided Plasma System
▶ February 12(Wen) - 14(Fri), 2014
▶ Venue: Hall A, B, C, D 1F&3F, COEX, Seoul, Korea
▶ Program: Exhibition, SEMI Technology Symposium
▶ Program: Press Conference, imec Technology Forum, Keynote Speech, Executive Forum, SEMI Technology Symposium(STS), LED Korea Conference 2014.
▶ Organized by: SEMI (Semiconductor Equipment and Material International)

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