Call for
Abstracts
Due Next
Wednesday:
February
3, 2021
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The AVS 21st International Conference on
Atomic Layer Deposition (ALD 2021) featuring the 8th
International Atomic Layer Etching Workshop (ALE 2021) will
be a three-day meeting dedicated to the science and technology of
atomic layer controlled deposition of thin films and now topics
related to atomic layer etching. Since 2001, the ALD
conference has been held alternately in the United States, Europe
and Asia, allowing fruitful exchange of ideas, know-how and
practices between scientists. This year, the ALD conference will
again incorporate the Atomic Layer Etching 2021 Workshop
(ALE 2021), so that attendees can interact freely. The
conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the
JW
Marriott Tampa Water Street in
Tampa, Florida. As in past conferences, the meeting will be
preceded (Sunday, June 27) by one day of
tutorials.
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ALD
Plenary
Todd
Younkin
(Semiconductor
Research Corporation, USA)
“Materials
& Innovation – Essential Elements that Underpin the Next
Industrial Revolution”
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ALE
Plenary
Steven
George
(University
of Colorado
Boulder,
USA)
“Mechanisms
of Thermal
Atomic
Layer Etching”
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Key
Deadlines:
Abstract
Submission Deadline: February 3, 2021
Author
Acceptance Notifications: March 16, 2021
Early
Registration Deadline: May 14, 2021
Hotel
Reservation Deadline: June 4, 2021
Manuscript
Deadline: November 1, 2021
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COVID-19 Alert: AVS recognizes the global
COVID-19 pandemic continues to impact face-to-face meetings. We
anticipate seeing you in Florida and we will continue to comply
with COVID-19 guidelines (local, state, and federal). As a
result, all meeting plans are subject to change to stay in
compliance with these COVID-19 guidelines. Hybrid options will be
considered as needed. Should an in-person meeting not be
feasible, a virtual component will be planned. Additional details
will be made available as the event draws closer.
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ALD
Program Chairs
Program
Chair:
Sean
Barry (Carleton University, Canada)
Program
Co-Chair:
Scott
Clendenning (Intel, USA)
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ALE
Program Chairs
Program
Chair:
Jane
Chang (University of California, Los Angeles, USA)
Program
Co-Chair:
Thorsten
Lill (Lam Research, USA)
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