Showing posts with label ALE2021. Show all posts
Showing posts with label ALE2021. Show all posts

Wednesday, January 27, 2021

Call for Abstracts ALD & ALE 2021 Tampa,FL, USA




Call for Abstracts

Due Next Wednesday:

February 3, 2021




The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida. As in past conferences, the meeting will be preceded (Sunday, June 27) by one day of tutorials.


ALD Plenary

Todd Younkin

(Semiconductor Research Corporation, USA)


“Materials & Innovation – Essential Elements that Underpin the Next Industrial Revolution”

ALE Plenary

Steven George

(University of Colorado

Boulder, USA)


“Mechanisms of Thermal

Atomic Layer Etching”


Key Deadlines:

Abstract Submission Deadline: February 3, 2021

Author Acceptance Notifications: March 16, 2021

Early Registration Deadline: May 14, 2021

Hotel Reservation Deadline: June 4, 2021

Manuscript Deadline: November 1, 2021


COVID-19 Alert: AVS recognizes the global COVID-19 pandemic continues to impact face-to-face meetings. We anticipate seeing you in Florida and we will continue to comply with COVID-19 guidelines (local, state, and federal). As a result, all meeting plans are subject to change to stay in compliance with these COVID-19 guidelines. Hybrid options will be considered as needed. Should an in-person meeting not be feasible, a virtual component will be planned. Additional details will be made available as the event draws closer.



ALD Program Chairs


Program Chair:

Sean Barry (Carleton University, Canada)

Program Co-Chair:

Scott Clendenning (Intel, USA)

ALE Program Chairs


Program Chair:

Jane Chang (University of California, Los Angeles, USA)


Program Co-Chair:

Thorsten Lill (Lam Research, USA)