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The 5th „ALD FOR INDUSTRY“ workshop will again show the bridge between basic science, industrialisation and commercialisation of this technology. According to a research study, „The global Atomic Layer Deposition Equipment (ALD) market is expected to reach USD 8.2 billion by 2026, growing at a CAGR of 28% from 2020 to 2026 layer, excellent adhesion of high aspect ratio surfaces and pinhole-free coatings.“
Interest in industrial solutions for Atomic Layer Deposition is increasing. This opens up new possibilities for innovative materials and designs in a wide range of applications. ALD is one of the best deposition methods for producing conformal and thin films. Furthermore, it is a key technology for the semiconductor industry, but not only for the semiconductor industry. Atomic layer deposition, is a thin film technology that enables new and highly innovative products for a wide range of applications.
In 2022 the EFDS will organize the 5th workshop „ALD FOR INDUSTRY“ in Dresden (Germany), at one of the focal points of European thin-film technologies in industrial applications and research. „ALD for industry provides the opportunity to get in touch with industrial and academic partners, to learn more about fundamentals of ALD technology and get informed about the latest research results on this topic.
The Workshop will focus on the currents markets for ALD and address the applications in Semiconductor industry, MEMS &Sensors, Battery technology, Medical, Display, Lightning and Photovoltaics.
EXHIBITION
You have the right products and services for our community? Come to the event and present your expertise.
At the exhibition you will have a table and space for one roll-up. During all breaks you will have the opportunity to get in discussion with the participants and speakers.
If you are interested, please contact info@efds.org with the comment „ALD for Industry“.
PROGRAM
Thank you to all speakers and the Program Committee. The Program for our Workshop 2022 is prepared. For more details please open the link above.
Program Committee 2022
Quentin Demarly, Air Liquide Advanced Materials, Paris, France
Dr. Christoph Hossbach, Picosun Oy and Picosun Europe GmbH, Dresden, Germany
Dr. Martin Knaut, IHM, TU Dresden, Germany
Prof. Mikko Ritala, University of Helsinki, Helsinki, Finland
Dr. Jonas Sundqvist, BALD Engineering AB, Wärmdö, Sweden
Dr. Claudia Wiemer, CNR IMM, Unit of Agrate Brianza, Italy
HOTEL RECOMMENDATION
114 EUR single room, including breakfast
Canceling free of charge until 7 days before the event
Code: ALD
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