Thursday, October 17, 2019

Intel Oregon is looking for young CVD, ALD and PVD experts

[Intel, Hillsboro Oregon, USA] We are hiring Ph.D. candidates or recently received a Ph.D. degree in the metals thin-film area. We are giving priorities to the candidates who have exceptional backgrounds in physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and/or Electrodeposition fields. Strong plasma physics and vacuum science knowledge will be needed for PVD, CVD, and ALD deposition area candidates. 
 Intels Fab D1X in Oregon USA (
We are also looking for candidates with synthetic chemistry backgrounds for CVD/MOCVD (metal-organic chemical vapor deposition) precursor development. In the Electrodeposition area, we are looking for candidates with a strong background in electrochemistry, plating related thin film deposition.

Generic Job description can be found here -

Please send me your resume directly to
Guest Blog by Dr. Shaestagir Chowdhury, Principal Engineer at Intel Corporation, Hillsboro, Oregon

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