Intel Oregon is looking for young CVD, ALD and PVD experts

[Intel, Hillsboro Oregon, USA] We are hiring Ph.D. candidates or recently received a Ph.D. degree in the metals thin-film area. We are giving priorities to the candidates who have exceptional backgrounds in physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and/or Electrodeposition fields. Strong plasma physics and vacuum science knowledge will be needed for PVD, CVD, and ALD deposition area candidates. 

 

 

 Intels Fab D1X in Oregon USA (Intel.com)

 

We are also looking for candidates with synthetic chemistry backgrounds for CVD/MOCVD (metal-organic chemical vapor deposition) precursor development. In the Electrodeposition area, we are looking for candidates with a strong background in electrochemistry, plating related thin film deposition.

Generic Job description can be found here - https://jobs.intel.com/ListJobs/ByKeyword/JR0099326/

Please send me your resume directly to shaestagir.chowdhury@intel.com

 

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Guest Blog by Dr. Shaestagir Chowdhury, Principal Engineer at Intel Corporation, Hillsboro, Oregon