UV Broadband Antireflection Coating Using Al2O3, HfO2 and SiO2 Multilayer by ALD

Researchers at Shanghai Institute of Technical Physics of The Chinese Academy of Sciences have studied UV broadband antireflection (AR) films prepared by ALD. The study reports results in the 250~390 nm spectral range. They showed that a higher transmittance was acquired when HfO2-Al2O3 nano-laminates replaced the sinngle HfO2 layer in the AR coating. The results was presented at the recent Optical Interference Coatings 2019 conference in Santa Ana Pueblo, New Mexico United States (2–7 June 2019).

Trancmitance of ALD AR coating. (Figure capture from Google)

Source: OSA Publishing, Optical Interference Coatings 2019 "UV Broadband Antireflection Coating Using Al2O3, HfO2 and SiO2 Multilayer by Atomic Layer Deposition" LINK