As reported by nanotechweb.org: An in situ measurement technique that can monitor the process of
atomic layer deposition (ALD) in real time has been developed by
scientists in Germany. The researchers used changes in the conductance
of layers over multiple ALD cycles to identify the different growth
phases as they occurred, allowing undesired modes of deposition to be
averted. The conductance signal was also used as the input to a genetic
algorithm that could optimize the growth rate semi-automatically.
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