TU Eindhoven present LEGO stop motion movie of a novel area-selective ALD approach

Stop motion movie of a novel area-selective ALD approach – Building a film with nanoblocks – literally! #ALDep https://t.co/pXFLgZXla9 pic.twitter.com/J9SqeNJm18

— AtomicLimits (@AtomicLimits) October 12, 2017

Please find the original publication in the Atomic Limits Blog (LINK) as well as the Open Source publication below.

A. Mameli, M. J. M. Merkx, B. Karasulu, F. Roozeboom, W. M. M. Kessels, and A. J. M. Mackus, Area-selective atomic layer deposition of SiO₂ using acetylacetone as a chemoselective inhibitor in an ABC-type cycle, ACS Nano 11, 9303 (2017), DOI: 10.1021/acsnano.7b04701