Wednesday, January 14, 2015

Hanwha Q Cells to evaluate SoLayTec InPassion technology

Dutch research spinoff SoLayTec has announced that Hanwha Q Cells has begun evaluating its atomic layer deposition (ALD) technology. The InPassion ALD can be deployed for PERC upgrades and n-type cell production.
“Last month in November SoLayTec announced it sold its first production machine in the U.S. for a 100MW n-type bi-facial cell line. Now also Hanwha Q CELLS decided to start the evaluation of the InPassion ALD system from SoLayTec for its high efficiency cell concepts in Thalheim (Germany).”

SoLayTec’s Görtzen says that the company’s goal is to demonstrate that the InPassion ALD process has a higher potential than the plasma-enhanced chemical vapor deposition (PECVD) approach.

“The biggest advantages of our spatial ALD tool compared to PECVD are a better step coverage, a stable uniformity and a layer thickness requirement of only 5 nm Al2O3,” said Görtzen. “Furthermore, if in the ALD cell process flow a direct PECVD is used for the SiN capping layer an integrated annealing process can be implemented, resulting in better cell performance compared to PECVD AlOx.”

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