Wednesday, December 19, 2018

Adrie Mackus at TU Eindhoven awarded NWO grants for development of sub 5nm ALE processing

Novel plasma processes for nanoelectronics

The fabrication of future sub-5-nanometer electronics requires etching with atomic level accuracy, which is beyond the reach of conventional plasma etching technology. In this project, novel plasma-based processes will be developed for layer-by-layer removal of material using atomic layer etching (ALEt). Adrie Mackus, leader of this project and Assistant Professor at the Plasma and Materials Processing group of Applied Physics, will collaborate with a diverse group of users from industry and academia, strengthening the leading position of the Netherlands in semiconductor equipment manufacturing.

Source: LINK

Nanolab@TU/e, a laboratory for nanotechnology research and innovation. Picture: Bart Van Overbeeke.

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