Monday, August 13, 2018

Virtual Issue: In Honor of Professor Markku Leskelä

This virtual issue celebrates Professor Markku Leskelä (University of Helsinki, Finland) and his decades-long career in the field of Atomic Layer Deposition (ALD). Prof. Leskelä has been the most productive ALD researcher through the history of ALD, and in 2004 he was nominated as an ISI Highly Cited Author in the field of materials science. He directed the Finnish Centre of Excellence in Atomic Layer Deposition (2012-2017) and received the American Vacuum Society ALD Innovation award in 2012.

The papers selected for this virtual issue in honor of Prof. Markku Leskelä are in two sections: one half authored by him and his coworkers, and the other half of the papers were collected by inviting researchers active in ALD chemistry to nominate a paper of their own where they feel they have been influenced by Prof. Leskelä's work. Some of Leskelä's papers are old enough to have gained a great number of citations, some others are very recent that we believe will gain similar attention in the coming years. Besides his ALD publications, a small selection on luminescent materials and organometallic catalysts are included to give some flavor of Prof. Leskelä's research interests and productivity outside ALD. 
Virtual Issue: In Honor of Professor Markku Leskelä
Mikko Ritala, Han-Bo-Ram Lee, Jillian Buriak, and Seán T. Barry
Chem. Mater., 2018, 30 (14), pp 4469–4474
DOI: 10.1021/acs.chemmater.8b02742