Tuesday, April 10, 2018

AVS Short Course Webinar on Atomic Layer Etching (ALE) June 13,2018


Atomic Layer Etching (ALE):
June 13,2018
REGISTRATION DEADLINE: June 11, 2018
The AVS Short Course Webinar focusing on Atomic Layer Etching (ALE) will be held on Wednesday, June 13, 2018 from 1:00-5:00 p.m (EDT). This webinar will be taught by Steven M. George, Professor in the Dept. of Chemistry & Biochemistry and Dept. of Mechanical Engineering, University of Colorado at Boulder. This AVS Webinar on ALE will provide the training required to understand plasma-assisted ALE and thermal ALE. The webinar will explain the process strategies for plasma-assisted ALE and thermal ALE. Important ALE approaches for many materials including Si, SiO2, Al2O3, TiN and W will be described that are useful for advanced semiconductor processing.

Who should attend: Scientists, engineers and technicians who use or plan to use atomic layer etching for atomic scale fabrication.

Syllabus: Learn More

Date: June 13, 2018

Time: 1:00-5:00 p.m. (EDT)

Cost: $200/person

REGISTRATION DEADLINE: June 11, 2018


Questions: E-mail heather@avs.org or call 530-896-0477.