Thursday, July 28, 2016

ALD2016 Ireland Photo show

The 16th International Conference on Atomic Layer Deposition (ALD 2016) was a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films. In every year since 2001, the conference has been held alternately in United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference incorporated the Atomic Layer Etching 2016 Workshop. The conference took place on 24-27 July 2016 at the Convention Centre Dublin, Ireland.

ALD2016 was a grand event and a success! Here I am collecting pictures from the event from Twitter (#ALD2016), The ALD Confernce and others - please send me pictures and I will publish them if you like to share them (jonas.sundqvist@baldengineering.com).



ALD2016 Co-Chairs Simon Elliott (Tyndall National Institute, Ireland) and Jonas Sundqvist (Lund University, Sweden / Fraunhofer IKTS, Germany) taking a final look into the Program before opening the conference on Monday morning. (Picture by ald2016.com)


Opening of ALD2016 by Kieran Drain CEO Tyndall National Institute. (Picture by ald2016.com)


Suvi Haukka from ASM International receiving The ALD Innovation Prize 2016. The prize was presented by last year's awardee Prof. Greg Parsons. (Picture by ald2016.com)



The conference chairs of ALD2016 (Simon Elliott and Jonas Sundqvist) and ALE2016 (Prof. Bert Ellingboe) together with Dennis Hausmann (International & Local Program Committee, Lam Research) learning how to pour a Pint of Gunniess at the Welcome reception that was held at the Guinness Store House in Dublin. (Picture by ald2016.com)