Saturday, February 22, 2014

Altatech (Soitec) to install new ALD/CVD system at Helmholtz-Zentrum Berlin

 

"Soitec’s Altatech subsidiary partners with Helmholtz-Zentrum Berlin and installs new CVD system

Altatech Semiconductor S.A. of Montbonnot, near Grenoble, France (a subsidiary of Soitec since January 2012) and Helmholtz-Zentrum Berlin für Materialien und Energie (HZB, a member of the Helmholtz Association of German Research Centres) have launched a collaborative partnership for R&D on materials for next-generation high-efficiency solar cells, including new classes of materials and innovative device structures for photovoltaic and photocatalysis applications.

 
 
The AltaCVD system will be used at EMIL to deposit amorphous silicon (alloys), transparent conductive oxides and ultra-thin dielectrics used in fabricating next-generation solar energy devices. The new EMIL building is adjacent to the third-generation storage ring BESSY II, and the cluster tool will be directly connected to an X-ray analytical end-station that accesses a dedicated beam line from BESSY II. Altatech and HZB will conduct atomic-layer deposition (ALD), plasma-enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) on substrates ranging from small research samples up to fully industry-compatible 6-inch wafers and use EMIL’s analytical capabilities to analyze material and interface properties in between successive processing steps. "
 
Further details in this press release:
 http://www.semiconductor-today.com/news_items/2014/FEB/ALTATECH_200214.shtml

Press release  from Helmholtz-Zentrum Berlin:
 http://www.helmholtz-berlin.de/pubbin/news_seite?nid=13925&sprache=en&typoid=49880

A cluster tool for the research on new classes of materials and device structures for photovoltaic and photocatalysis applications. (Source: Altatech)