This year, the ALD conference (ALD 2018) took place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea. The ALD conference did again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018).
Here is a collection of Tweets relating to the ALD equipment manufacturers presenting and exhibiting at the conference. Please let me know if I missed any!
Here is a collection of Tweets relating to the ALD equipment manufacturers presenting and exhibiting at the conference. Please let me know if I missed any!
Pisosun and NSI opening up
ALD Nanosolutions : LINK
ALD NanoSolutions is on the ground in Asia and ready for #ALDALE2018. Stop by our booth or use https://t.co/dyDM8YwCTw to discuss your application/product needs. #ALDep #Incheon #Lithium #ElectricCars #materials #manufacturing #pharma #coatings #disruptive #innovation #Products— ALD NanoSolutions (@ALDNano) July 24, 2018
Beneq : LINK
Thank you #ALDALE2018 Incheon, Korea pic.twitter.com/s8qvDrd5ER— Beneq Corporation (@beneqcorp) August 1, 2018
Kurt J Lesker : LINK
We are looking forward to #ALDALE2018 in Incheon, South Korea! Come and talk to our experts at Booth 47, July 29 to August 1! https://t.co/TgNICvZsdu #ALDep @AvsAld pic.twitter.com/H4JIv0DsLT— Kurt J. Lesker Co (@KurtJLeskerCo) July 26, 2018
Lam Research: LINK
Coming up at #ALDALE2018: K. Sharma and D. Hausmann will review the In Situ Surface Reaction Mechanism Studies on ZrO2 Atomic Layer Deposition from Tetrakis (ethylmethylamino) zirconium along side K. Sharma on Tuesday, July 31. pic.twitter.com/urKY24Cgh2— Lam Research (@LamResearch) July 30, 2018
Don’t miss our last workshop at #ALDALE2018: Benefits of Atomic Layer Etching for Material Selectivity will be entirely run by our Lam Research team. Special thanks to Thorsten Lill, K.J. Kanarik, S. Tan, I. Berry, V. Vahedi, R. Gottscho and see them on Tuesday, July 31, 4:00 PM. pic.twitter.com/ZKByHC3aH7— Lam Research (@LamResearch) July 31, 2018
Oxford Instruments : LINK
First talk at the #ALDALE2018 conference for my colleague Yi Shu @OxInst good job and good crowd. pic.twitter.com/lFl6vV4dxv— Harm Knoops (@HarmKnoops) August 1, 2018
Good turnout at 8am for a talk on "Challenges for Plasma Etching" given by Dr Mike Cooke at ALD2018 Conference in Korea. For more info come visit us at #booth No22 #ALDALE2018 #atomiclayerdeposition #atomiclayeretching #conference pic.twitter.com/dcZSGPurQq— Oxford Instruments (@OxInst) July 31, 2018
— Picosun Oy (@PicosunALD) July 31, 2018
Tokyo Electron : LINK
The last tutorial at #ALDALE2018 by Peter Ventzek @TokyoElectronUS : Modeling and simulation approches to atomistic control in #ALDep and #ALEtch @AvsAld pic.twitter.com/Wl3mK0djWZ— Jeong Hwan Han (@Jeonghwan_Han_) July 29, 2018
Wonik IPS : LINK
The next plenary talk #ALDALE2018 #ALDep session is delivered by Jinsung Chun from Wonik IPS : A Road to Damascus, ALD technology @AvsAld pic.twitter.com/HeEC2ggoIj— Jeong Hwan Han (@Jeonghwan_Han_) July 30, 2018