Sunday, October 31, 2021

Nanofabrication via Maskless Localized Atomic Layer Deposition of Patterned Nanoscale Metal Oxide Films

Here is a cool demonstration of direct write Spatial ALD or LOCALD like the researches at Laboratoire des Multimatériaux et Interfaces, University of Lyon is calling it.

Nanofabrication via Maskless Localized Atomic Layer Deposition of Patterned Nanoscale Metal Oxide Films
ACS Applied Nano Materials (IF5.097), Pub Date : 2021-10-18, DOI: 10.1021/acsanm.1c02550
Laabdia Midani, Waël Ben-Yahia, Vincent Salles, Catherine Marichy

A modified open-air spatial atomic layer deposition (SALD) head is employed to fabricate complex oxide patterns on various substrates. The co-reactant being kept in the surrounding atmosphere, a simple injection head that consists of three concentric nozzles with only one precursor outlet has been designed. Easy and reversible modification in the diameter of the metal precursor outlet permits direct patterning with different lateral sizes. Maskless deposition of uniform and homogenous TiO2 and ZrO2 thin films is successfully demonstrated with a lateral resolution tuned from millimeters to hundred micrometers range while keeping the film thickness in the range of a few to hundreds of nanometers with a control at the nanoscale. This localized SALD approach, named LOCALD, also enables layer stacking and deposition on structured substrates.




Supporting information: an1c02550_si_001.pdf

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