Sunday, January 31, 2021

AVS Webinar: Plasma-Assisted Atomic Layer Deposition: From Basics to Applications

Atomic Layer Deposition (ALD) has become a key technology in both the lab and the fab with many devices and other applications benefiting from the (ultra)thin films that can be prepared with very precise thickness control and with unparalleled conformality and uniformity. Nowadays, a significant number of the ALD processes employed are so-called plasma-assisted or plasma-enhanced ALD processes. In the last decade, this method has faced a real breakthrough in high-volume manufacturing and an extensive set of processes and reactor designs have been demonstrated. Yet the reasons why and when to use plasma-assisted ALD are often not clear as well what kind of plasma configurations to use and which conditions to apply. Also, misconceptions about the implications of using plasmas during ALD exist, for example with respect to plasma damage and limitations of conformality. This webinar will address these aspects starting with the basics of ALD and plasma-based processing and will range up to the applications that can benefit from plasma-assisted ALD.

Wednesday, February 10, 2021 01.00 pm to 05:00 pm (Eastern Time USA/Canada -5:00 UTC)

Presenter: Erwin Kessels, Professor Dept. of Applied Physics Eindhoven University of Technology Netherlands

Webinar Objectives/Topics 
  • Provide the basic concepts of plasma-based processing and thin-film preparation by (plasma-assisted) ALD 
  • Gain knowledge on the role of reactive and energetic species such as radicals, ions, and photons on the process and resulting film properties, including film conformality on 3D surface topologies 
  • Present an overview of plasma ALD reactors and discuss important design and processes parameters 
  • Discuss several plasma-assisted ALD processes for key material systems 
  • Give insight into existing and potential future applications of plasma-assisted ALD 
  • Understand the pros and cons of plasma-assisted ALD with respect to thermal ALD

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