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Journal of Vacuum Science & Technology  is  More than Vacuum Recent Atomic Layer Processing Articles

Submit Your Articles on Atomic Layer Processing to JVST    The following articles are free to download for next 30 days: Quasi-atomic layer etching of silicon nitride Sonam D. Sherpa and Alok Ranjan J. Vac. Sci. Technol., A 35, 01A102 (2017) | Read More    Predicting synergy in atomic layer etching Keren J. Kanarik, Samantha Tan, Wenbing Yang, Taeseung Kim, Thorsten Lill, Alexander Kabansky, Eric A. Hudson, Tomihito Ohba, Kazuo Nojiri, Jengyi Yu, Rich Wise, Ivan L. Berry, Yang Pan, Jeffrey Marks, and Richard A. Gottscho J. Vac. Sci. Technol., A 35, 05C302 (2017) |  Read More    Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori, Masaru Zaitsu, Akiko Kobayashi, Toshihisa Nozawa, and Nobuyoshi Kobayashi J. Vac. Sci. Technol., A 35, 01A103 (2017) | Read More    Review Article: Plasma-surface interactions at the atomic scale for patterning metals Nicholas D. Altieri, Jack Kun-Chieh Chen, Luke Minardi, and Jane P. Chang J. Vac. Sci. Technol., A 35, 05C203 (2017) |  Read More    Atomic layer etching in close-to-conventional plasma etch tools Andy Goodyear and Mike Cooke J. Vac. Sci. Technol., A 35, 01A105 (2017) |  Read More    Correcting defects in area selective molecular layer deposition Richard G. Closser, David S. Bergsman, Luis Ruelas, Fatemeh Sadat Minaye Hashemi, and Stacey F. Bent J. Vac. Sci. Technol., A 35, 031509 (2017) | Read More    Revisiting the growth mechanism of atomic layer deposition of Al2O3: A vibrational sum-frequency generation study Vincent Vandalon and W. M. M. (Erwin) Kessels J. Vac. Sci. Technol., A 35, 05C313 (2017) | Read More    High-k oxides by atomic layer deposition-Applications in biology and medicine Marek Godlewski, Sylwia Gierałtowska, Łukasz Wachnicki, Rafał Pietuszka, Bartłomiej S. Witkowski, Anna Słońska, Zdzisław Gajewski, and Michał M. Godlewski J. Vac. Sci. Technol., A 35, 021508 (2017) |  Read More    Atomic layer deposition of h-BN(0001) on RuO2(110)/Ru(0001) Jessica Jones, Brock Beauclair, Opeyemi Olanipekun, Sherard Lightbourne, Mofei Zhang, Brittany Pollok, Aparna Pilli, and Jeffry Kelber J. Vac. Sci. Technol., A 35, 01B139 (2017) |  Read More    Atomic fluorine densities in electron beam generated plasmas: A high ion to radical ratio source for etching with atomic level precision David R. Boris, Tzvetelina B. Petrova, George M. Petrov, and Scott G. Walton J. Vac. Sci. Technol., A 35, 01A104 (2017) |  Read More