The TECHCET ALD/CVD High-k & Metal Precursors Critical Materials Report™ provides information on the
applications, IP-filing and markets associated with front end and back end of line
precursors used to produce high-k dielectrics, metals, meatl oxides and nitrides by
atomic layer deposition (ALD) and chemical vapor depsotion (CVD) metal oxides and nitrides. The report is written by Jonas Sundqvist and edited by Lita Shon-Roy.
Full table of contents : LINK
TECHCET Reports can be Included with CMC Membership – Click Here for Info!
No comments:
Post a Comment