Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating

[Tokyo Electron] Researchers at UC Santa Barbara along with TEL and SRC have collaborated to develop new methods for selective spin coating. With wide-ranging applications in the future of semiconductor patterning as device makers are challenged to build more complex transistors and simultaneously lower costs. 

They demonstrate that accurate control over the process parameters allows incomplete trichlorosilane self-assembled monolayers (SAMs) to induce spin dewetting on both homogeneous (SiO₂) and heterogeneous (Cu/SiO₂ or TiN/SiO₂) surfaces. Under optimal conditions, spin dewetting on line–space patterns results in the selective deposition of polymer over regions not functionalized with SAM.  

Source: "Rapid and Selective Deposition of Patterned Thin Films on Heterogeneous Substrates via Spin Coating"  LINK