Films for this study were deposited in a Picosun R75-BE ALD reactor and WCl6 (99.9%, Strem) delivered at 125 °C using the solid state booster in the reactor. You may find more details an the ALD redactors at their lab here (LINK).
Please check out the publication in JVSTA A - Open source available for all!
Free, Published Online: November 2017Accepted: October 2017
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36, 01A104 (2018); https://doi.org/10.1116/1.5002667
Nice little story on thermal #ALDep of tungsten carbide online now. TMA is definitely the most versatile ALD precursor https://t.co/65yNQpNcDl
— Kyle Blakeney (@nano_Kyle) November 15, 2017
Also nice to see the refernce No. 33 to this Blog :-)