AVS ALD 2016 Incheon, South Korea - Call for abstracts
Call for Abstracts
Deadline: February 16, 2018
The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will
be a three-day meeting dedicated to the science and technology of
atomic layer controlled deposition of thin films and now topics related
to atomic layer etching. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.
in past conferences, the meeting will be preceded (Sunday, July 29) by
one day of tutorials and a welcome reception. Sessions will take place
(Monday-Wednesday, July 30-August 1) along with an industry tradeshow.
All presentations will be audio-recorded and provided to attendees
following the conference (posters will be included as PDFs). Anticipated
attendance is 600+.