Monday, October 16, 2017

TU Eindhoven present LEGO stop motion movie of a novel area-selective ALD approach

Please find the original publication in the Atomic Limits Blog (LINK) as well as the Open Source publication below.

A. Mameli, M. J. M. Merkx, B. Karasulu, F. Roozeboom, W. M. M. Kessels, and A. J. M. Mackus, Area-selective atomic layer deposition of SiO2 using acetylacetone as a chemoselective inhibitor in an ABC-type cycle, ACS Nano 11, 9303 (2017), DOI: 10.1021/acsnano.7b04701