AVS Conference on Atomic Layer Deposition (ALD 2015), Portland, Oregon June 28 - July 1

The AVS Topical Conference on Atomic Layer Deposition (ALD 2015) will be a three-day meeting (preceded by one day of tutorials), dedicated to the science and technology of atomic layer controlled deposition of thin films. Atomic layer deposition (ALD) is used to fabricate ultrathin and conformal thin film structures for many semiconductor and thin film device applications. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. ALD is receiving attention for its potential applications from advanced electronics, microsystems, and displays to energy capture and storage, solid state lighting, biotechnology, security, and consumer products - particularly for any advanced technologies that require control of film structure in the nanometer or sub-nanometer scale.

 

ALD 2015 will feature a special focus on Industrialization of ALD, comprising a parallel track of sessions devoted to the technical and strategic challenges involved in moving ALD into products and competitive manufacturing across a wide variety of applications. ALD's unique capabilities promote tremendous diversity in potential applications with value for specialized, custom applications as well as mass manufacturing. Abstract submissions are encouraged in areas such as ALD manufacturability, equipment design, modeling and simulation, sensing and advanced process control, high throughput strategies, and emerging ALD applications to supplement a group of invited talks in these sessions.

As in past conferences, the presentations will follow an all-electronic format, and electronic copies of the presentations (including oral component, and questions and answers) will be made available in the form of copy-secured DVDs.

This year an ALE Workshop will be held in conjunction with ALD 2015; see details below.

Abstract Deadline: February 16, 2015
Prospective authors are invited to submit their abstracts online by February 16, 2015. Abstract submission will open November 2014.

Sponsorship/Exhibit Opportunities
Download the ALD Sponsorship/Exhibit Form

. . . . . . . . . . . . . . . . . . . . . . . . . . .

Conference Chairs:
Dae-Gyu Park
IBM T.J.Watson Research Center
dpark@us.ibm.com
Charles Winter
Wayne State University
chw@chem.wayne.edu