Webinar "Taking Nano to the next level" on 26th March 2014 Presented by keynote industry speakers. Hosted by the IOP on Wed 26th March at 5pm (GMT), 9am Pacific Time.
This webinar is free of charge, and will run for 1 hour including time for questions and answers at the end. A focus on recent nanoscale etch and atomic layer deposition (ALD) advances from research to
manufacturing applications, from industry leading speakers:
Talk 1: ALD and nanoscale etch processing techniques and results from recent work carried out at Lawrence Berkeley National Laboratory (LBNL), USA
Speaker: Deirdre Olynick, Staff Scientist, LBNL, CA, USA
Talk 2: Data storage, an expanding market application that has benefited from advanced ALD and nanoscale etch techniques
Speaker: Kim Lee, Seagate, CA, USA