ALD News Week 38

Solid-state batteries get a boost with new protective coating

Link: https://www.anl.gov/article/solidstate-batteries-get-a-boost-with-new-protective-coating

“A thin, glass-like layer could help protect solid-state batteries from degradation, researchers say. They use a process called atomic layer deposition (ALD) to apply a protective layer.” (ANL)

Microwave enhanced atomic layer deposition (MW-ALD): Incorporating a microwave antenna into an ALD reactor
Link: https://pubs.aip.org/avs/jva/article/43/5/052403/3361679/Microwave-enhanced-atomic-layer-deposition-MW-ALD

“Atomic layer deposition (ALD) is a technique widely used for thin film deposition with excellent uniformity and conformality. In this work, we present a modification of a conventional ALD system by integrating a microwave antenna to explore how microwave energy can enhance film growth and reduce cycle times, particularly for materials that are otherwise difficult to deposit.” (AIP Publishing)

Impacts of different thickness Al2O3 and SiO2 atomic layer deposition sidewall passivation layers on GaN-based devices
Link: https://pubs.aip.org/avs/jvb/article/43/5/052209/3361926/Impacts-of-different-thickness-Al2O3-and-SiO2-atomic-layer-deposition-sidewall
 
“The sidewall passivation layer has a critical effect on the performance and reliability of GaN-based devices. In this study, we investigate how varying the thickness of atomic layer deposition (ALD) Al₂O₃ and SiO₂ sidewall passivation layers influences device leakage, breakdown voltage, and surface recombination. The results show that thicker layers can better suppress leakage but may lead to trade-offs in other device parameters.” (AIP Publishing)

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Forge Nano to Unveil Commercial Single Module Semiconductor Wafer Fab ALD Tool at SEMICON Taiwan
Link: https://www.globenewswire.com/news-release/2025/09/04/3144564/0/en/Forge-Nano-to-Unveil-Commercial-Single-Module-Semiconductor-Wafer-Fab-ALD-Tool-at-SEMICON-Taiwan.html

DENVER, Sept. 04, 2025 (GLOBE NEWSWIRE) -- Forge Nano, Inc., a technology company pioneering domestic battery and semiconductor innovations, today announced it is unveiling a new commercial single module semiconductor wafer fab atomic layer deposition (ALD) tool – TEPHRA^{One}. The fully automated 200 mm single module platform is outfitted with features from Forge Nano’s flagship multi-process module TEPHRA in a streamlined configuration for oxide, nitride, metal and nanolaminate coatings. (GlobeNewswire)

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New Tool Announcement: Thermal/Plasma ALD System Now Available for User Access
Link: https://nanofab.ucsd.edu/new-tool-announcement_thermal-plasma-ald-system/

We are happy to announce that the new Arradiance GEMStar Thermal & Plasma ALD (Atomic Layer Deposition) System is now available for user access. This advanced system supports both thermal and plasma enhanced ALD processes and is designed to allow users to explore a wide range of thin film materials and process conditions. (nanofab.ucsd.edu)

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Press Release “ALD for Industry 2025” - Dresden
Link: https://efds.org/en/45604/

Dresden, March 12, 2025 – The 8th International Conference “ALD FOR INDUSTRY” has once again bridged the gap between basic research, industrialization and commercialization of atomic layer deposition (ALD). This event, which has been held annually in Dresden since 2017, once again welcomed over 100 participants from 14 countries and numerous exhibitors this year despite the strike at German airports. (efds.org)

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News & Announcements: Continuous, high-speed atomic layer deposition for thin-film coatings
Link: https://www.anl.gov/amd/news-announcements

“Self-exhausting” precursor pulses enable fast, precise coating applications for … (ANL)

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