Tuesday, September 2, 2014

Scalable LABVIEW program for multiprecursor flow-type ALD system

A scalable LABVIEW control program to control flow type atomic layer deposition (ALD) reactor from University of Illinois at Chicago. The program supports processing with multiple precursor delivery lines. The program logic is written and tested in LABVIEW environment to control ALD reactor with four precursor delivery lines to deposit up to four layers of different materials in cyclic manner.
 
So now you just have to add it all together "How to build your ALD reactors for less than $10,000" and you´re up and running ALD in no time for almost no money!
 
 
Sathees Kannan Selvaraj and Christos G. Takoudis
 
J. Vac. Sci. Technol. A 33, 013201 (2015)

The authors report the development and implementation of a scalable control program to control flow type atomic layer deposition (ALD) reactor with multiple precursor delivery lines. The program logic is written and tested in LABVIEW environment to control ALD reactor with four precursor delivery lines to deposit up to four layers of different materials in cyclic manner. The programming logic is conceived such that to facilitate scale up for depositing more layers with multiple precursors and scale down for using single layer with any one precursor in the ALD reactor. The program takes precursor and oxidizer exposure and purging times as input and controls the sequential opening and closing of the valves to facilitate the complex ALD process in cyclic manner. The program could be used to deposit materials from any single line or in tandem with other lines in any combination and in any sequence.
 
 
block diagram of the ALD program. The program consists of six custom-written sub-VI programs.

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