Are
you willing to get recognition and attention in the ALD community? Do
you hold ALD news, articles, presentations, podcasts, videos,
conference/workshop/tutorial invitation or promotion in your pocket that
you want to share with the ALD community?
Then, here is the world's best ALD platform: BALD Engineering Guest Blog. No matter at what stage you are in your career; this is for you if ALD or ALE is your cup of tea. Write your own blog and share your own content or interesting news on the BALD Engineering Guest Blog; also, feel free to promote it in your social media network.
Content Guidelines:
- Up to 1000 words, including html-links.- Up to 3 images (without copyright violation).
- References as links or as DOI number for journal references.
Blog ending includes:
--------------------------------------Guest blog by [first name] [last name], [affiliation] (optional)
Location: [city], [country]
Web page: (optional)
LinkedIn link: (optional)
Twitter link: (optional)
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ALD is a special adaptation of chemical vapor deposition (CVD) technique pioneering in semiconductor production and suitable for manufacturing inorganic material layers with a thickness down to a fraction of monolayers
ReplyDeleteA. M. Shevjakov
Atomic layer deposition (ALD) has gained a lot of attention as a thin film deposition method, as it is uniquely suitable for depositing uniform films on complex three-dimensional topographies. Compared to other chemical vapor deposition (CVD) techniques or physical vapor deposition (PVD) ALD furthermore has the particularity to control the thickness and composition of the deposited material at an atomic level. Therefore it is one of the revolutionary methods in the production of dielectrics in semiconductors that allow to reduce the chip size keeping Moore´s law. ALD is also a usual in electro optics, biomedical devices, photovoltaics and microelectronics and part of our Thin Films Process Equipment portfolio at PhotonExport.
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