Wednesday, September 21, 2016

Sub-100 nm features seamless roller mold using anodization and ALD for R2R nanoimprint lithography

Here is a really cool open access paper form A*STAR on using direct anodization and ALD to prepare a sub-100 nm seamless roller mold for roll-to-roll nanoimprinting. The ALD after the  Al roller mold was deposited with  TiO films in a home-built ALD setup at 150 °C using TiCl4 and water.

LK Tan, AYY Ho - Journal of Vacuum Science & Technology B, 2016 - scitation.aip.org 3 days ago - The authors demonstrate an approach using direct anodization and atomic  layer deposition (ALD) to prepare a sub-100 nm seamless roller mold for roll-to-roll nanoimprinting. In this approach, the roller mold is prepared by direct anodization of a ...