Save the date - AVS ALD & ALE 2021 June 27-30, 2021, Tampa, Florida
Save the Date
June 27-30, 2021, Tampa, Florida
The AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) will
be a three-day meeting dedicated to the science and technology of
atomic layer controlled deposition of thin films and now topics related
to atomic layer etching. Since 2001, the ALD conference has been held
alternately in the United States, Europe and Asia, allowing fruitful
exchange of ideas, know-how and practices between scientists. This year,
the ALD conference will again incorporate the Atomic Layer Etching 2021 Workshop (ALE 2021), so that attendees can interact freely. The conference will take place Sunday, June 27-Wednesday, June 30, 2021, at the JW Marriott Tampa Water Street in Tampa, Florida.
As in past conferences, the meeting will be preceded (Sunday, June 27) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, June 28-30) along
with an industry tradeshow. All presentations will be audio-recorded
and provided to attendees following the conference (posters will be
included as PDFs). Anticipated attendance is 800+.
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