Tuesday, August 16, 2016

Invited Speakers for China ALD 2016 Announced

Following the successes of the previous two international Conferences on ALD Applications and China ALD Conferences since 2010, the 3rd International Conference on ALD Applications & 2016 China ALD Conference will be a four-day meeting, dedicated to the fundamentals and applications of Atomic Layer Deposition (ALD) technology in various fields. It will be held in Suzhou, China, from October 16 to 19, 2016. This conference will feature plenary sessions, oral sessions, poster sessions and industrial exhibitions.

Recently the Keynote Speakers (see above) as well as the list of Invited Speakers have been updated and can be found here: http://www.c-ald.com/Data/View/69.

Also full contributed papers will be peer reviewed and published in a special issue Nanoscale Research Letters (2015 impact factor: 2.584)​.