Friday, January 13, 2017

Hybrid Remote Plasma ALD / MLD process for OLED Encapsulation

Chinesse reserachers from Jilin University reports in Nature Scientific Reposts on Zircone PEALD/MLD encapsulation üprocess for OLED. Chen, Z. et al. published "Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes" Sci. Rep. 7, 40061; doi: 10.1038/srep40061 (2017).

They used a PEALD chamber from Kemicro (PEALD-150A, Ke-Micro) to deposit the hybrid ZrO2/zircone nanolaminate was deposited using a remote Plasma set up. The reaction mechanism of PEALD process was investigated using an in-situ quartz crystal microbalance (QCM) and in-situ quadrupole mass spectrometer (QMS). The precursors was tetrakis(dimethylamino)zirconium (TDMAZ) and the O2 remote plasma.


VTT Finland to present PillarHall – test structures for accelerating thin film R&D at ALD For Industry

VTT Technical Research Centre of Finland Ltd., to present silicon wafers and chips that can enable easy analysis of thin film conformality using well-defined, record-demanding microscopic 3-D structures at ALD For Industry in Dresden 17-18 January. The presentation "PillarHall – Lateral high aspect ratio test structures for accelerating thin film R&D" will be given by Dr. Mikko Utriainen who has a Ph.D. in ALD applications in chemical sensors in 1999 by employing ALD semiconductor metal oxides and metal ALD processes.

PillarHall® Backgound & Abstract

Conformality is a key figure of merit of ALD processes and increasingly important in 3D semiconductor devices, but challenging to quantify. Vertical test structures rely typically on time-consuming cross-sectional SEM analyses. PillarHall® lateral test structures enable easy, fast, and accurate measurements of thin film conformality in 3D structures with conventional surface analysis tools.[1]

 PillarHall® – accelerating thin film R&D, “What you can’t measure, you can’t improve.” [1]

PillarHall dimensions vary from the scale from <100 to > 1000 nm, and aspect ratios (AR) from low (5:1) to high (e.g., 40:1) to record-high (10000:1). With PillarHall and conventional microscopy, one can quickly analyse and optimize thin film process parameters to achieve the desired conformality at a given AR. Other information like e.g., the variation in thickness, chemical composition, microstructure and electrical properties along the film profiles provide insights of the process chemistry. This presentation will describe the PillarHall concept and show some recent examples of its use.

PillarHall® References

[1] PillarHall® – accelerating thin film R&D : www.pillarhall.com
 
[2] Nucleation and Conformality of Iridium and Iridium Oxide Thin Films Grown by Atomic Layer Deposition
M. Mattinen, J. Hämäläinen, F. Gao, P. Jalkanen, K. Mizohata, J. Räisänen, R. L. Puurunen, M. Ritala, M. Leskelä, Langmuir 32 (2016) 10559-10569.
http://dx.doi.org/10.1021/acs.langmuir.6b03007 

[3] Microscopic silicon-based lateral high-aspect-ratio structures for thin film conformality analysis
F. Gao, S. Arpiainen, R. L. Puurunen, J. Vac. Sci. Technol. A (letter) 33 (2015) 010601 (5 pages).
http://dx.doi.org/10.1116/1.4903941, open access [PDF]





Thursday, January 12, 2017

CMC Conference 2017 Call For Papers

Submit abstracts by February 15th for May 11-12 event in Dallas, Texas

San Diego, CA, January 09:  TECHCET CA—the advisory service firm providing electronics materials information—and the Critical Materials Council (CMC) of semiconductor fabricators announce a Call For Papers (CFP) to be presented at the next CMC Conference to be held May 11-12, 2017 in Dallas, Texas. Building on the success of the first CMC Conference held last May in Portland (http://cmcfabs.org/seminars/), the 2017 event will provide a structured framework to catalyze the flow of actionable technical and supply-chain information related to critical materials. 



Following the annual members-only CMC meeting to be held May 9-10, the 2017 CMC Conference is open to the public. Business drives our world, but technology enables the profitable business of manufacturing new devices in IC fabs, and new devices need new materials. In addition to panel discussions, presentation sessions will focus on the following topics:

    Global Issues & the Supply Chain,
    Immediate Challenges of Materials & Manufacturing, and
    Emerging Materials Challenges.

To submit a paper for consideration, please send a 1-page abstract focusing on critical materials supply dynamics by February 15, 2017 to cmcinfo@techcet.com.

On behalf of the Conference Committee,
Lita Shon-Roy, Jonas Sundqvist, Ed Korczynski

ABOUT CMC:  The Critical Materials Council (CMC) of Semiconductor Fabricators (CMCFabs.org) is a membership-based organization that works to anticipate and solve critical materials issues in a pre-competitive environment. The CMC is a unit of TECHCET, an advisory service firm focused on fabrication supply-chains, electronic materials technology, and materials market analysis for the semiconductor, display, solar/PV, and LED industries.

ABOUT TECHCET:  TECHCET CA LLC is an advisory service firm focused on process materials supply chains, electronic materials technology, and materials market analysis for the semiconductor, display, solar/PV, and LED industries. Since 2000, the company has been responsible for producing the SEMATECH Critical Material Reports, covering silicon wafers, semiconductor gases, wet chemicals, CMP consumables, Photoresists, and ALD/CVD Precursors. For additional information about these reports or CMC Fabs membership please contact Diane Scott or Michel Walden at info@cmcfabs.org  +1-480-332-8336, or go to www.techcet.com or www.cmcfabs.org

Tuesday, January 10, 2017

Nanowire week in Lund, Sweden 29th May - 2nd June, 2017

10th Nanowire Growth Workshop + 9th NANOWIRES = Nanowire Week

5 days of lively discussion on all areas of nanowire research, from growth to applications

The Nanowire Week will take place in Lund, Sweden from May 29 – June 2, 2017. Nanowire Week is the merger of two well-established and highly successful annual workshops: NANOWIRES and the Nanowire Growth Workshop. Nanowire Week will cover all topics of nanowire-related research, from fabrication and fundamental properties to applications.