AlixLabs signs agreement to use the lab facilities of NanoLund

AlixLabs signs agreement to use the lab facilities of Sweden’s largest research environment for nanoscience and nanotechnology. At the same time moves in to Ideon Scinece Park in Lund, Sweden.

NanoLund, founded in 1988, is the Center for Nanoscience at Lund University and a Strategic Research Area funded by the Swedish government. Encompassing 55 research groups in the faculties of engineering, science and medicine, more than 130 PhD students.

https://www.nano.lu.se/

AlixLabs (Link)

Get in touch with AlixLabs - save cost for future leading edge nodes in Semi

For more than 15 years now (since 2004, Samsung 90 nm DRAM) Atomic Layer Deposition (ALD) processing is keeping the advanced chips manufacturable, ensures performance and scaling, and pushing cost down for the consumer. Guess what - now we want to do the same by applying Atomic Layer Etching (ALE) into the leading edge Logic and Memory nanopatterning process flow - helping lithography keeping the overall cost down for you the consumer.

We at AlixLabs invite you to come and chat with us to learn more!

AlixLabs Get in touch!

Cost analysis after break down of the Samsung Galaxy S20 Ultra. Credit: TechInsight

AlixLabs ramps up activities and employs Dr. Mohammad Karimi as Principal Scientist

After successfully securing additional soft funding from VINOVA, AlixLabs AB ramps up activities in Lund, Sweden,  and employs Dr. Mohammad Karimi as Principal Scientist. Mohammad Karimi received his PhD in Physics from Lund University in 2020, where he worked on design, nano-fabrication and characterization of novel optoelectronic devices based on semiconductor nanowires. Dr. Karimi has authored and co-authored more than 20 journal publications and conference presentations in the field of solid-state physics and III-V semiconductor devices.

Mohammad Karimi Research Portal and publications at Lund University (LINK)

Dr. Mohammad Karimi as Principal Scientist, AlixLabs AB

Atomic Layer Etching for Nano Device Fabrication at AlixLabs

We provide an ALE-based method of manufacturing nanostructures with a characteristic size below 20 nm.

This is a new method of nanostructure fabrication using the atomic layer etching process, which is inherently a damage-free etch process. The recently discovered etching process selectivity to inclined surfaces, allows to use walls of tapered structures as a mask. The inclined surfaces can be readily fabricated by e.g. dry etching or epitaxial growth, and will provide masking during the atomic layer etching process.

The key Tool for ALE development - An Inductively coupled plasma reactive ion etching (ICP-RIE) system Apex SLR from Advanced Vacuum Systems AB. The system is designed for controlled nanoscale etching of Si, SiO₂, Si₃N₄, W, Mo and polymers (resists) with fluorine-based chemistry. Unprotected surfaces of the following materials are not allowed: glasses, noble metals (Au, Ag, Pt, Cu, Pd), heavy metals (Cd, Pb, Zn) and certain types of polymers (e.g. silicones). In total, 8 process gases are presently available: SF₆, CHF₃, CF₄, C₄F₈, Ar, O₂, H₂, N₂. LINK

The inclined surfaces can be readily fabricated by e.g. dry etching or epitaxial growth, and will provide masking during the atomic layer etching process. This process therefore provides access to fabrication of extremely small structures in a very precise and efficient way.

AlixLabs is a user at Lund Nanlo Lab, Lund University, Sweden

Lund Nano Lab (LNL) is an open research facility that is available to both academic research groups, start-up and company users. Our world-class clean room facility is equipped with state-of-the-art semiconductor processing and metrology equipment.

• ISO 5 and ISO 7 cleanroom facility for cutting edge nano- and micro-fabrication
• 24/7 access for accredited academic research and company users
• Fabrication and analysis of structures on the micro- and nanometer-scale
• Wide range of equipment for Growth, Lithography, Deposition, Etch and Characterisation
• Centre of excellence for Epitaxial growth of III-V materials
• Industrial product development and prototype testing
• Staffed by expert equipment and process experts available to provide user training

Lund Nano Lab is one of the main resources within NanoLund and provides support to research groups in strategically important areas of research such as:

• Nanowire growth and material science
• Fundamental and device physics, electronics and photonics
• Nano-bio and life science
• Exploratory nanotechnology
• Growth and physics of new materials
• Nanowire-based photovoltaics
• Processing of nanoelectronic devices and circuits

AlixLabs receives Vinnova grant for "Innovative startups"

93 Swedish startup companies with innovative business ideas share 28 million SEK from Vinnova. The companies receive funding to develop new solutions that can contribute to sustainable development and increased competitiveness.

The companies receive a grant of up to SEK 300,000 for developing prototypes or developing their business model. "The support enables young companies with risky projects to try their ideas and get some way to find an investor, customer or partner," says Emelie Falk, responsible for the announcement at Vinnova. Some of the startup companies that receive funding:

Some of the startup companies that receive funding:

Aquammodate AB, A new filter technique for purifying drinking water, based on natural materials with high purity and low energy consumption. 

 

HIPOR Materials AB, Reflective ceramics for space applications, which combines high insulation with high solar reflectance.

Alixlabs AB, Atomic Layer Etching for sub 10 nm semiconductor manufacturing - Proof of Concept

AlixLabs

Fundamental to the entire IT explosion is the miniaturization that enabled an explosive increase in functionality with a reduced cost and power consumption. Moore's law describes the speed of this miniaturization in a way that has been valid since the mid sixties. However, we are now approaching a limit for the development with resolutions on individual atoms, where 10 nm corresponds to about 20 atoms.

AlixLabs has found and patented a phenomenon that makes it possible in a much simpler and cheaper way to manufacture semiconductors sub 10 nm. Our method can be said to use similar physical problems that other methods try to circumvent.

AlixLabs website