Thursday, March 26, 2020

NCD supplied two Lucida M300 ALD systems for R&D to KANC

NCD has recently supplied 2 Lucida M300PL ALD systems to KANC. Lucida M300PL-O is the equipment for oxide deposition with Ozone and Plasma process, and Lucida M300PL-M is that for metal deposition with Plasma process.

These wafer process equipment have the specification below

1) System: Lucida M300PL-O, Lucida M300PL-M

2) Substrate: Wafer 300mm

3) Deposition Materials:

- Lucida M300PL-O: Al2O3, TiO2, ZrO2, ZnO, HfO2, Ta2O5

- Lucida M300PL-M: Co. Ru, W, Ir, TiN, TaN

KANC, which is the most prestigious institute of Korea on nanotechnology, is using Lucida M300PL to investigate cutting edge semiconductor development and promising applications in MEMS and IoT. So it will be expected that these systems will contribute very much to the development of high-end nanotechnology.

NCD will do best to be the best ALD equipment company with continuous R&D efforts. 
 
 
 
< Lucida M300PL ALD >

2 comments:

  1. The NCD's provision of two Lucida M300 ALD systems to KANC for R&D is truly commendable. This state-of-the-art equipment promises to elevate KANC's research capabilities, enabling cutting-edge advancements in technology. The Lucida M300's precision and efficiency are poised to catalyze breakthroughs in materials science and innovation. NCD's commitment to fostering research and development is evident in this generous contribution, empowering KANC to explore new frontiers and drive positive change. This collaboration exemplifies a synergy between industry and research, reflecting a shared vision for progress. The Lucida M300 ALD systems mark a significant step towards pushing the boundaries of knowledge and innovation, and their impact on KANC's R&D endeavors is poised to be transformative. Gratitude to NCD for their visionary support in advancing scientific exploration.

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