Showing posts with label VPHA. Show all posts
Showing posts with label VPHA. Show all posts

Friday, September 25, 2015

ALD Russia 2015 workshop: a travel report by Riikka Puurunen

The Atomic Layer Deposition Russia 2015 (“ALD Russia”, in short) workshop was organized by Moscow Institute of Physics and Technology (MIPT), in Dolgoprudny, Moscow region, on September 21-23, 2015. The chairman of the workshop was Anatoly Malygin from St. Petersburg Technological Institute; Dr. Andrey Zenkevich and Dr. Andrey Markeev from MIPT were in charge of the local organizing committee. The workshop was opened by the rector of MIPT, corresponding member of RAS, professor Nikolay Kudryavtsev. According to the organizers, 67 people were registered to attend the workshop.

From left: Puurunen, Malygin, Parsons. Photographer: Abdulagatov (Riikka Puurunen, Twitter)

Invited speakers at the workshop were:
Anatoly Malygin (St. Petersburg Technological University, Russia), Steven M. George (University of Colorado at Boulder, USA), Gregory N. Parsons (Carolina State University, USA), Riikka Puurunen (VTT Technical Research Centre of Finland), Annelies Delabie (IMEC, Belgium), Hyungjun Kim (Yonsei University, Korea), Cheol Seong Hwang (Seoul National University, Korea), Robert M. Wallace (University of Texas at Dallas, USA), Andrey Markeev (Moscow Institute of Physics and Technology, Russia), Sabina Spiga (Laboratorio MDM, IMM-CNR, Italy), Andrey Zenkevich/Yury Matveev (Moscow Institute of Physics and Technology, Russia), Vladimir Gritsenko (A. V. Rzhanov Institute of Semiconductor Physics of SB RAS, Russia), Ingo Dirnstorfer (NaMLab, Germany), Vladislav Vasilyev (Novosibirsk State Technical University and SibIS LCC, Russia), Giovanna Scarel (James Madison University, USA), Erwin Kessels (Eindhoven University of Technology, The Netherlands), Sean Barry (Carleton University, Canada), Svetlana Dorovskikh (A. V. Nikolaev Institute of Inorganic Chemistry SB RAS), and Evgeny Gornev (Mikron, Russia).

The scientific programme of the workshop was a balanced mixture of various subject areas, for example, ALD/PEALD precursor and process development, atomic layer etching, 2D materials, semiconductor applications, and thin film conformality analysis. Some truly futuristic talks were included in the programme, e.g. related to neural networks with ALD-grown memristors. There were also two talks that looked backwards in time: one on the historical developments of ALD under the name Molecular Layering in USSR/Russia; and one describing the organization of the on-going Virtual Project on the History of ALD (VPHA), a volunteer-based project where new participants are welcome and needed.

The non-scientific programme at the workshop consisted of a Moscow river cruise on Tuesday evening. The participants were transported with a bus from Dolgoprudny (through the well-known traffic jam of Moscow) to the centre of the city. With the private boat accompanied with a guide, the participants travelled along the Moskva river for about five hours, passing places such as Tretjagovskii Gallery, Kreml and the Red Square, and seeing also the statue of Peter the Great. At the boat, food was excellent and plenty. Many discussions were carried out in a forward-looking, pleasant sphere, and new connections made.


At the end of the workshop, the participants had a chance to visit the laboratories at MIPT.

As specified at the website http://ald-conf.ru/, the goal of the workshop was to “consolidate the rapidly growing Russian ALD community, and to bring Russian researchers closer to leading international experts in the field.” In my view, this target was met: many leading scientists from Russia, several European countries, USA, Canada and Korea got together at the workshop, interacted during presentations, and enjoyed each other’s company at the social event.

With this travel report, I want to thank the organizers at MIPT for creating this unique event. I also express my thanks to Gregory Parsons, who had come up with the idea that this kind of a workshop should be organized, and to Giovanna Scarel, who thereafter advanced this idea with her long-term collaborators at MIPT. While this meeting was not directly related to the ongoing ALD history project VPHA, it is evident that the VPHA has ripened the time for this type of workshop to happen.

This workshop was the first of its kind. The organizers envisioned that there will be continuation in one way or another --- how exactly, is left for the future to show. My hope is that the international ALD community could once meet in St. Petersburg, where ALD research has been carried out already over fifty years.

Espoo, September 25, 2015
Riikka Puurunen
Senior Scientist, VTT Technical Research Centre of Finland
Coordinator of the Virtual Project on the History of ALD (VPHA)

  • The slides of the talk related to Virtual Project on the History of ALD can be found through the VPHA webpage, see http://vph-ald.com/ALD-history-publications.html (direct link here). The slides of the ML-ALD talk should appear at the same VPHA website in the near future. The goal of the organizers was also to later collect and share the slides presented at the workshop through the workshop website http://ald-conf.ru/.
  • In Twitter, the workshop became known with hashtag #ALDRussia.

Tuesday, July 21, 2015

The Nucleation Dependent Growth Layer: A Structure Element in Electrocrystallization - The 10th William Blum Lecture 1969

I was scaning the internet on Kolschuetter and "Atomic Layer" hoping finding proof on the pre-1950´s discovery of ALD (sorry) and came across this rather interesing reviw paper for a lecture in 1969 - Bunching and debunching effects very fascinating indeed and just look how the images and graphs, which are so much more beautiful than today!

"This paper is a re-publication of the 10th William Blum Lecture, presented at the 56th AES Annual Convention in Detroit, Michigan, on June 16, 1969. Prof. Dr. Hellmuth Fischer discussed his work on the theory of plating and how the electrochemistry and use of additives in the bath led to different types of deposit structure"
 
Prof. Dr. Hellmuth Fischer
Recipient of the 1968 William Blum AES Scientific Achievement Award



Originally published as Plating, 56 (11), 1229-1233 (1968).

Editor’s Note: This paper is a re-publication of the 10th William Blum Lecture, presented at the 56th AES Annual Convention in Detroit, Michigan, on June 16, 1969.  A printable PDF version is available by clicking HERE.
ABSTRACT
For the first time, it has been shown by Eichkorn that layer growth (not of growth-spirals) depends on continued nucleation of monoatomic layers building up growth layers.  This has been done by determination of nucleation-overvoltage η and thickness of growth layers.  During formation of growth layers, overvoltage must surpass η and time dependent adsorption of foreign substances must control the motion rate of monoatomic layers.  Growth layers can develop to whiskers, columnar crystals, fiber textures, twinned or randomly dispersed structures.


Subsequent nucleation, outgrowth and "bunching" of atomic layers forming a macrostep.

 

Sunday, June 28, 2015

ALD History reading to re-activate, more voluntary contributors welcome

The volunteer-based Virtual Project on the History of ALD (VPHA), launched about two years ago (AVS ALD 2013, San Diego), has already significantly advanced our understanding of the history of ALD. It has become clear that ALD has been invented twice independently of each other, under different names, at different times and geographical locations. 



The main VPHA activity, reading and commenting on early ALD works up to 1986, has so far resulted in three joint publications (see http://vph-ald.com/Publication%20Plan.html). It is getting time to complete the reading and create at least one more publication, aimed at the AVS ALD 2016 conference.

AVSALD 2014 #ALDep conference: the two #VPHA posters, with co-authors from Bilkent (Riikka, Twitter)


VPHA in numbers: 

* There are currently 325 ALD papers listed up to year 1986. 
* About 1000 comments to be given (at least three comments per paper). 
* 36 people from ten countries and >20 affiliations have already given comments in the ALD-history-evolving-file. 
* There is room for many more to join and contribute.


Baltic ALD 2014 in Helsinki: Eating Finnish Pirogs and reading Russian ALD papers looking for the first reference for HfO2 by ALD (Riikka and Henrik)

The condensed publication plan of VPHA is below; full publication details you find from the website created for the VPHA collaboration: http://vph-ald.com. There is also a LinkedIn group, with discussions related to the VPHA and other ALD history aspects:https://www.linkedin.com/groups/ALD-History-5072051/about


...and then the answer pointed out by Prof. Drozd himself.

If you are interested joining this unique international collaborative effort, we warmly welcome you on board. For an active start, you can directly add comments in the ALD-history-evolving-file. We are also in the process of creating a “workflow” which will guide one to read the articles that need it the most.


Skype call planning for the VPHA reading project (Riikka, Ruud, Henrik and Jonas)

Info on the progress of “the workflow” and other things will be shared in the ALD History LinkedIn group and through occasional emails to the VPHA authors and prospective authors. To join this VPHA email list, please send me (Riikka) a message - either reply to this post, send a LinkedIn message, or email riikka.puurunen@vtt.fi. 

Best regards, 
Riikka Puurunen, the (unofficial) VPHA coordinator 

--- 

1) Poster at Baltic ALD 2014 - done 
2) Poster at ALD 2014, Kyoto - done 
3) Presentation at ALD 2014, Kyoto - done 
4) ALD history tutorial at ALD 2014, Kyoto – done 
5) Essay on the early history of ALE-ALD – done 
6) Website for ALD history and VPHA – done, http://vph-ald.com
7) Exhibition: 40 years of ALD in Finland - Photos, Stories (FinALD40) – done 
8) Review article/essay on the early history of ML-ALD - ongoing 
9) Presentation at ALD 2016 - ONGOING 
10) Optional: general ALD history review article 
11) Updating wikipedia 
12) Closing the VPHA

Friday, October 17, 2014

A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

 
Chem. Vap. Dep. Article first published online: 15 OCT 2014
DOI: 10.1002/cvde.201402012

Atomic layer deposition (ALD) is a thin film growth technique based on the repeated use of separate, saturating gas-solid reactions. The principle of ALD has been discovered twice; in the 1960s under the name “molecular layering” in the Soviet Union, and in the 1970s under the name “atomic layer epitaxy” (ALE) in Finland. In 2014, it is forty years since the filing of the worldwide patent on ALE as a method for the growth of compound thin films. This essay celebrates the fortieth anniversary of ALE-ALD, briefly telling the story of ALE as shared by its Finnish inventor, Dr. Tuomo Suntola. Initially, ALE was aimed at the growth of high-quality polycrystalline ZnS thin films for electroluminescent (EL) display panels. Gradually, the material selection of ALE increased, and the application areas were extended to photovoltaics, catalysis, semiconductor devices, and beyond. Fast, production-worthy ALE reactors were imperative for industrial success. The unprejudiced creation of new technologies and products with ALE, initiated by Dr. Tuomo Suntola and led by him until early 1998, are an integral part of the Finnish industrial history, the fruits of which are seen today in numerous applications worldwide.
 

Sven Lindfors in 1978 next to the flow-type ALD reactor in which the successful H2S/ZnCl2 process was demonstrated.

 

* The author thanks Tuomo Suntola for sharing these and other details of the development of ALE and EL. It has been a great honor and privilege to work with him and to write this history. Writing this history was triggered by the parallel-running worldwide Virtual Project on the History of ALD (VPHA). Warmest thanks to Tuomo Suntola for his support for the VPHA, too. The author also acknowledges Tapio Alvesalo for checking the details related to NAPS, Dr. Marko Tuominen for the details related to ASM Microchemistry, Juhana Kostamo for the details related to Picosun, Prof. Victor Drozd for confirming the timing of Suntola's visit to Leningrad, Prof. Yukihiro Shimogaki and Prof. Markku Leskelä for identifying the second-left participant in the ALE-1 photograph, and Prof. David Cameron for polishing the language in this article. Funding by the Academy of Finland's Centre of Excellence in Atomic Layer Deposition (ALDCoE) is gratefully acknowledged.

Thursday, September 4, 2014

"40 Years of ALD in Finland - Photos, Stories" - view the exhibition at Semicon Europa

[as posted by Riikka Puurunen on LinkedIn] Originally built for Baltic ALD in May, Helsinki, the exhibition "40 Years of ALD in Finland: Photos, Stories" will travel to the ALD symposium at Semicon Europa, Grenoble, 7 Oct 2014 (http://www.semiconeuropa.org/node/2171).

In June, the exhibition visited the AVS-ALD 2014 conference in Kyoto.

Duplicates of the exhibition can currently be viewed at the University of Helsinki and VTT. At VTT, the exhibition has just been extended and will be up until the end of year 2014.

In addition, a small version is on display in the entrence to Fraunhofer IPMS-CNT High-k Devices Group office in Dresden, Germany. :-)
 
 
"40 Years of ALD in Finland: Photos, Stories"  in the entrence to Fraunhofer IPMS-CNT, High-k Devices Group office. 


Monday, June 16, 2014

Thursday, June 12, 2014

Webhosting for The Virtual Project on the History of ALD - VPHA

Webhosting for The Virtual Project on the History of ALD - VPHA - through BALD Engineering. The Virtual Project on the History of ALD is a worldwide collaborative effort, carried out in atmosphere of openness, respect and trust - anyone welcome to attend! Please check for future updates!


VPHA main links:




VPHA files


Other ALD history presentations/blog posts:





Malygin presentation [to be updated]



Events

AVS ALD 2014 in Kyoto Japan - Tutorial & Workshop
June 15th 2014, Sunday
16:20-17:10 ALD History
by Riikka Puurunen, VTT, Finland

Poster Session
June 16th Monday, 18:00‐20:00
16P003 On the Early History of ALD: Molecular Layering
Riikka Puurunen et al., VTT Technical Research Centre of Finland, Finland

Saturday, May 31, 2014

Exhibition: 40 Years of ALD in Finland - Photos, Stories

40 years ago, Dr. Tuomo Suntola and his group demonstrated the growth of ZnS thin films in alternating, saturating gas-solid reactions. This initiated the development of Atomic Layer Deposition (ALD) in Finland and gradually led to industrial and academic activities worldwide. The famous patent on Atomic Layer Epitaxy (FIN 52359) was filed on November 29, 1974. (from http://www.vtt.fi/news/2014/events/12_5_to_19_8_2014.jsp)
 

"40 Years of ALD in Finland: Photos, Stories” organizers in front of the finalized posters, Dr. Riikka Puurunen and Dr. Jaakko Niinistö (Picture from Twitter, Riikka Puurunen @rlpuu).


Celebrating the round years, the Academy of Finland’s Finnish Centre of Excellence on Atomic Layer Deposition, led by professor Markku Leskelä of the University of Helsinki, is organizing an exhibition: “40 Years of ALD in Finland: Photos, Stories”. Initially, the exhibition was organized for the international Baltic ALD conference, May 12-13, 2014, Helsinki (http://www.aldcoe.fi/bald2014/). The main organizers of the exhibition have been Dr. Riikka Puurunen (VTT) and Dr. Jaakko Niinistö (University of Helsinki).

The exhibition material can be viewed at:
- VTT, Micronova, Tietotie 3, Espoo (Mon-Fri 8:00 - 16:30), from May 12 to August 29, 2014 and
- University of Helsinki, Chemicum, A.I. Virtasenaukio 1, Helsinki (Mon-Fri 7:45 - 19:00), from August 15 to October 15, 2014
 
There is also information out there that the Exhibition will travel to Japan for the ALD conference. Stay tuned. :-)

 

Monday, May 26, 2014

T. Suntola, "From ideas to global industry" BALTIC ALD, May 12-13, 2014, University of Helsinki

Dr. Tuomo Suntola, has shared his opening presentation "From ideas to global industry" from the recently held Baltic ALD conference, May 12-13, 2014, University of Helsinki [thanks Riikka for sharing].
 
BALTIC ALD, May 12-13, 2014, University of Helsinki
(some snapshots form the presentation that I find especially interesting, follow the link for the complete presentation)
 
 
In late 1973 instrumentarium Oy was searching for new challenges. 1.1.1974 a research unit headed by Tuomo Suntola was formed and The Proposal was given to the board by Dr. Tuomo Sunola: "Let´s develop an electroluminicent flat panel display...nobody has done it yet"
 
 
 
 
The famous picture of Sven Lindfors, today Chief Technology Officer and a Member of the Board of Directors of Picosun.“We had numerous unsuccessful test runs behind us. Dr. Tuomo Suntola knew that in order to proceed, we needed to advance from using pure chemical elements to an exchange reaction based on carrier gases and sulphides,” says Sven Lindfors, at the time working as a key technician for Dr Suntola’s team. (Source Picosun Newsletter :  http://www.picosun.com/binary/file/-/id/3/fid/79/).
 
 
 
Introduction of high-k materials by ALD in the semiconductor industry for DRAM Capacitors and MOSFETs and the contribution of ALD to the learning curve to keep up with Moore's Law.
 
Follow this link for an overvie on his work concerning Atomic Layer Deposition and thin film devices. The page includes articles, books patents, and conference presentation material from Dr. Tuomo Suntola. ranging back to the early 70s: http://www.sci.fi/~suntola/ald.html

Additional ALD presentations given by Tuomo Suntola in the last 10 years that can also be downloaded from this page:

 T. Suntola, "30 years of ALD"
ALD 2004 Conference, University of Helsinki
 
Russian-Finnish Scientific Conference, 12 – 13 September 2007, Helsinki
 
T. Suntola, "35 years of ALD"
Winter-School Picosun World Forum, 9-10 June 2009, Espoo
 
ENHANCE - Winter-School 9-12 January 2012, University of Helsinki
 
 

Friday, February 21, 2014

The Virtual Project on the History of ALD (VPHA) are looking for more contributors

"In the Virtual Project on the History of ALD (VPHA), we are still looking for more contributors (now we are with 35). Expertise of ALD on carbon or on porous materials would be especially useful. Also people are needed who know Russian language, and also some German speakers. Despite these "special requests", everyone, who knows a bit about ALD and speaks "only" English can contribute meaningfully. In return for volunteering, a position is offered as an author of the ALD history presentations to come, at Baltic ALD in May in Helsinki and at the AVS-ALD meeting in June in Kyoto."
 
Riikka Puurunen (Dr.), Senior Scientist, VTT Technical Research Centre of Finland
Jonas Sundqvist (Dr.), Group Leader High-k Devices, Fraunhofer IPMS-CNT, Germany
Annina Titoff, editor-in-chief, www.aldpulse.com
 
BALD 2014, Helsinki : http://www.aldcoe.fi/bald2014/
AVS-ALD 2014, Kyoto : http://www.ald2014.org/