Showing posts with label OLED. Show all posts
Showing posts with label OLED. Show all posts

Friday, September 23, 2016

Rumor: Apple 2017 iPhone may have Samsung's new Flexible OLED made by ALD

Here are some unconfirmed information that ALD will be used in the next generation Apple iPhone as of 2017.In addition, Korea IT News is claiming that both Samsung and LG have finalized the R&D phase of introducing ALD barrier technology for OLED and are now working closely with Korean ALD OEMs to go to production. Companies mentioned are Jusung Engineering, WONIK IPS, AP System, and TES.

With Apple reportedly shifting to iPhones with OLED displays starting in 2017, it will be interesting to see if Apple will be using Samsung's latest OLED technology that may be ready for the 2017 anniversary iPhone. According to a new OLED report, Samsung Display and LG Display are working to introduce ALD (Atomic Layer Deposition) technology to flexible OLED thin-film encapsulation process. They both have worked closely with their equipment partners to get them up to speed. ALD technology will add an important component to OLED displays for smartphones that add protecting organic materials from oxygen and water that will increase the overall life of a display. Samsung in particular is reported to be "working fast to introduce ALD technology." 
LINK: http://www.patentlyapple.com/patently-apple/2016/09/apples-2017-iphone-may-use-samsungs-new-flexible-oled-atomic-layer-deposition-technology.html

Checking the Korean ALD companies on the stockmarket give no hint or reaction that any of them are about to sign big deals.



Last 6 months performance for an index based on Korean companies with ALD Technology that may be used for OLED Encapsulation. Tes Co Ltd, Jusung Engineering Co., Ltd., EugeneTechnology Co Ltd and Wonik IPS Co Ltd. (Plotted using Google Finance)

Wednesday, August 31, 2016

NCD to deliver Lucida GD series ALD system for OLED encapsulation with Chinese display manufacturer, TIANMA

NCD reports today (8/31 2016) :The OLED market is going to prospect fast gigantic growing in the near future because OLED has the possibilities of bending, folding and various forms like circle, therefore it will be applied for flexible and wearable devices. Flexible OLEDs need excellent thin encapsulation layers in order to keep the property from the permeation of water and oxygen under the external environment using repeated bending, folding and rolling of devices. However, the current encapsulation based on PECVD is not satisfied with future flexible OLEDs, so new encapsulation technology would absolutely be required.

Many OLED manufactures are currently reviewing to use ALD technology because of obtaining the highest property from the encapsulation layers of OLED, but they have not been solving the low throughput and particle issues followed by using their ALD systems.

In order to clear these problems, NCD has completed to develop the 6th ALD equipment for thin film encapsulation which satisfies high quality, large area and high throughput applying for the inventive ALD technology, and we have been also continuously testing customer’s samples. NCD’s ALD encapsulation layer shows much better properties than that of PECVD, and the encapsulation capability on application for foldable products has been confirmed from the customers. As a result, NCD has recently entered into the contract with Chinese display manufacturer, TIANMA to supply the 5.5th generation class ALD system of Lucida GD series for thin film encapsulation of OLED. It apparently shows that NCD’s core technologies and the result of developments have been approved by the oversea customer.

NCD will keep doing our best to set Lucida GD series as the standard of all of flexible OLED encapsulation equipment with this achievement and become the number one global ALD Company with the best competitiveness making new challenges and developments.

Lucida™ GD Series ALD


High throughput atomic layer deposition system for OLED displays 



Cluster system for Lucida™ GD series


Applications

  • Barrier layer(Al2O3, TiO2) for flexible substrate
  • WVTR(water vapor transmission rate) 5.3x10-5g/m2·day (tritiated water test @30nm Al2O3/PEN substrate)
  • Encapsulation layer(Al2O3,TiO2) for OLED
  • Applications of mass-product

Benefits

  • High throughput : > 30 panels/hour
  • Substrate size : > 6G (1500 x 1850mm2)

Features

  • Advanced process kit and small volume chamber for short gas cycle times
  • Extremely materialize ALD mechanism
  • Small foot print
  • Totally integrated process module
  • Easy process control

Technical specifications