Thursday, February 2, 2023
Dutch ALD euipment leader ASM to invest $100 mil. in Korea for facility expansion
Monday, October 10, 2022
NCD’s ALD technology and equipment for oxidation barrier of copper-based substrates
Copper is a metal used widely as the main material of Printed Circuit Board (PCB) and Lead Frame. But it is required to protect the oxidation because copper is easily oxidized in the condition of humidity, temperature, and pH, etc.
Electroless Nickel Immersion Gold (ENIG), Organic
Solderability Preservative (OSP), Immersion Sn or Ag (ImSn or ImAg) is
generally used to prevent oxidation of opened copper area after Solder Masking
in PCBs. The lead Frame is protected from oxidizing by plating Au, Ag, Pd, and Ni
after Lead Frame forming.
Recently, many groups have studied about preventing
oxidation on the surface of copper by various corrosion protection layers of
ALD metal oxides. Especially, Appling Al2O3 layer to the oxidation barrier is
actively being researched.
< Surface images and TEM & EDS of Cu plates coated by ALD thin films after annealing test >
After depositing Al2O3 layers on Cu-plated plates with various film thicknesses and process temperatures, the oxidation and corrosion behavior of the coated copper was examined with different annealing times in the oven. There was no oxidation before annealing, but after annealing for 1hr, as the sample’s thickness lowered and process temperature decreased, the oxidation happened and increased gradually. There was no oxidation on the plates coated with 50~60 ALD cycles and at process temperatures of 70~100℃ after annealing for 5hr, and oxidation didn’t occur only in the case of 60 cycles and 100℃ after annealing for 24hr.
To analyze the change of the structure and confirm the oxidation
behavior, TEM and EDS were measured on 5 and 10nm Al2O3 coated Cu plates at 100℃.
The results showed that a thick Cu oxide layer was built by combining Cu coming
out through the 5nm Al2O3 layer and outer oxygen after annealing.
On the other side, in the case of depositing 10nm Al2O3 film,
the ALD layer was maintained after annealing, so Cu oxide layer wasn’t built on the
surface. Therefore it confirmed that 10nm ALD Al2O3 layer showed an excellent
corrosion barrier.
< ALD equipment for Lead Frame and PCB >
Copper-based PCBs and Lead Frames for semiconductors may have great properties to prevent humidity and oxygen by ALD-coated corrosion barriers.
NCD has high volume and large area ALD equipment and
technology for this kind of application. ALD tools for Lead Frames could be
used by adding a dedicated transfer module on the base of Lucida GSH Series. And
NCD has been developing new ALD equipment, Lucida GP Series, for large and
flexible PCB substrates. NCD would extend the new ALD application area continuously
through constant R&D.
Source:
http://www.ncdtech.co.kr/2018/bbs/board.php?bo_table=eng_board_05&wr_id=57
Tuesday, June 1, 2021
South Korean equipment makers recorded mixed results in the first quarter of 2021
- Fab equipment vendors posted high growth, while display equipment firms underperformed.
- Fab equipment makers benefited from aggressive spending by semiconductor companies.
- CVD/ALD equipment companies showed good growth, see below (Jusung, Wonik IPD, Eugene Technologies
Friday, June 5, 2020
Thermal ALD IGZO Properties for LTPO TFTs by NCD
Recently applications of LTPO (Low Temperature Polycrystalline Oxide) TFTs have been increasing to save the powder consumption of mobile and wearable devices. LTPO TFTs are the device combining LTPS TFTs with fast speed and Oxide TFTs with low leakage current. That is, switching uses Oxide TFTs because of being on/off the light fast and operating uses LTPS TFTs due to changing display rapidly with control of the mount of light.
A lot of smart device manufacturers including Apple are using or will use LTPO displays for their latest smart watches because their power consumption can decrease ~40%. Also, many manufacturers like Samsung and Apple have actively been developing their high-end smart phones equipped with the LTPO displays to make the power usage optimized.
IGZO thin films used for Oxide TFTs have typically been processed by sputtering, but this method continuously has been showing lots of issues such as their bad thickness and composition uniformity, degradation of the physical and electrical properties due to plasma damage and the stability problem of targets. However using thermal ALD-IGZO, it is possible to deposit high quality thin films because of no plasma damage in process, low process temperature, and atomic scale controllability of thickness and composition.
It is possible to get exact target atomic compositions of IGZO thin films by controlling the ratios of ALD cycle of respective sources in thermal ALD. Therefore this method could show the superior device properties to that by sputtering because it enables to control easily and exactly the most suitable atomic composition for the respective device structure of customers.
NCD has been developing high throughput batch IGZO-ALD system with its creative technology enabled to adapt the target atomic composition for respective devices. NCD could provide the competitiveness of excellent quality and the high productivity for LTPO TFTs including IGZO thin films using Lucida GD Series ALD which could process many and large area substrates at once.
Source: http://www.ncdtech.co.kr/2018/bbs/board.php?bo_table=eng_board_05&wr_id=51
Tuesday, November 13, 2018
NCD launch new updated website for ALD technology and equipment
Wednesday, March 7, 2018
NCD Contracted with Risen Energy to supply 1.8GW solar cell ALD equipment
This system is (Lucida GS Series + Automation), the main product of NCD's solar division, to increase the efficiency of solar cells by depositing high quality Al2O3 ALD thin films. Lucida GS Series is batch type ALD deposition equipment that forms backside passivation of Al2O3 on multiple wafers and can process more than 4.500 wafers (@ 4nm thickness) of 156mm x 156mm size per an hour. By applying Lucida GS Series in the production of solar cells, customers can dramatically lower the production cost of high efficiency solar cells due to the high-volume productivity, high yield, efficient gas consumption and low maintenance cost compared to competitors.
Lucida GS Series has become the first choice for ALD process in high efficiency solar cell manufacturing, based on its advantages and excellence. NCD expects to record the best sales by the rapid sales growth in the solar sector in 2018.