Please finde here a review of AVS ALD2019 / ALE 2019 by Prof. Kessels, whom recieved the ALD Innovator Award and gave a presentation at the plenary session on Monday morning.
Report: Atomic Limits LINK
Presentation download: Atomic Scale Processing: from Understanding to Innovation LINK
Showing posts with label ALD2019. Show all posts
Showing posts with label ALD2019. Show all posts
Monday, August 12, 2019
Thursday, June 20, 2019
Technical program for AVS ALD2019 and ALE2019 in Bellevue, Washington USA
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Thursday, June 13, 2019
Call for papers -Atomic Layer Deposition and Atomic Layer Etching in JVSTA
Manuscript Deadline: November 1, 2019
These 2020 Special Topic Collections are planned in collaboration with ALD 2019 and the ALE 2019 Workshop to be held in Bellevue, WA from July 21—July 24, 2019. The Special Topic Collection will feature sections dedicated to the science and technology of atomic layer controlled deposition and to the science and technology of controlled etching of thin films. While a significant number of articles will be based on material presented at ALD 2019 and the ALE 2019 Workshop, research articles on ALD and ALE but not presented at this conference are also welcome. The special topic collection will be open to all articles on the science and technology of ALD and ALE.Authors are encouraged to use the JVST template. Online, you will have an opportunity to tell us that your paper is a part of the Special Topic Collection by choosing either the “ALD Special Topic Collection” or the “ALE Special Topic Collection.” See recent Collections: ALD 2019, ALE 2019, ALD 2018, ALE 2018.
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