Showing posts with label ALD2018. Show all posts
Showing posts with label ALD2018. Show all posts

Friday, August 3, 2018

Awards at ALD / ALE 2019, Incheon South Korea

Congratulations - The ALD Innovator award “For Original Work and Leadership in ALD” was given to Prof. Hyungjun Kim at School of Electrical and Electronic Engineering at Yonsei University (LINK). Today he is managing the NCNT semiconductor lab and leads research in Graphene, Nanoscale semiconductor devices, Nano thin film deposition by ALD, Thin film characterization, Solar cell, Flat panel devices (Thin film transistor). 


Prof. Hyungjun Kim at School of Electrical and Electronic Engineering at Yonsei University

Previous Years this award has been given to:

  • 2011: Roy Gordon
  • 2012: Markku Leskela
  • 2013: Steve George
  • 2014: Hyeongtag Jeon
  • 2015: Greg Parsons
  • 2016: Suvi Haukka
  • 2017: Jeff Elam



Team Helsinki University was awarded with a presentation and poster award to Georgi Popov and Chao Zhang.

“Atomic Layer Deposition of Lead(II) Iodide,” Georgi Popov et al (University of Helsinki‚ Finland)

"Area-Selective Atomic Layer Deposition of Zinc Sulfide Based on Inherent Selectivity" Chao Zhang et al (University of Helsinki‚ Finland)




In addition there was a number of other awards but the AVS page have not announced those winners yet. However, worth mentioning is that Peter King was awarded with losing a bet to a Canadian. This award has previously gone to Jonas Sundqvist (BALD2014). Mysteriously though, there is still no picture around with Sean Barry sporting a Swedish Bow tie...




Wednesday, August 1, 2018

ALD equipment manufacturers tweets at ALD 2018

This year, the ALD conference (ALD 2018) took place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea. The ALD conference did again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018).

Here is a collection of Tweets relating to the ALD equipment manufacturers presenting and exhibiting at the conference. Please let me know if I missed any!

Pisosun and NSI opening up

ALD Nanosolutions : LINK 
Beneq : LINK 

Kurt J Lesker : LINK
Lam Research: LINK

Oxford Instruments : LINK


Picosun Oy : LINK 

Tokyo Electron : LINK 
Wonik IPS : LINK 


Thursday, February 1, 2018

Invited speakers and tutorials for AVS ALD & ALE 2018 in Incheon Korea

The invited speakers and tutorials for AVS ALD & ALE 2018 in Incheon Korea have been announced! Please follow the link here for full details (LINK). A lot of experts from the South Korean ALD Industry and Fabs will present, including offcourse the early industry adopters (DRAM!) Samsung Electronics and SK Hynix as well as suppliers like Wonik IPS and UP Chemical and a good mix of the worlds best experts will be there as well ALD and ALE. Noting also that there will be multiple presentations from Japan for ALE like Sony (cool!), Toshiba and Tokyo Electron.

As for other years the exhibition has been sold out but sponsoring is open!

SUBMISSION for abstarcts deadline is also close - February 16, 2018 (LINK)



Thursday, January 4, 2018

Call for Abstracts - AVS 18th International Conference on Atomic Layer Deposition (ALD 2018)


The  AVS 18th International Conference on Atomic Layer Deposition (ALD 2018)  featuring the  5th International Atomic Layer Etching Workshop (ALE 2018)  will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. The conference will take place Sunday, July 29-Wednesday, August 1, 2018 , at the Songdo Convensia in Incheon, South Korea.

As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

Key Deadlines:
Abstract Submission Deadline: February 16, 2018
Author Acceptance Notifications: April 9, 2018
Student Award Applications Deadline: May 1, 2018
Early Registration Deadline: June 1, 2018
Hotel Reservation Deadline: June 26, 2018
JVST Special Issue Deadline: September 5, 2018

Wednesday, November 8, 2017

AVS ALD 2016 Incheon, South Korea - Call for abstracts

Call for Abstracts
Deadline: February 16, 2018
The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea. 
 

As in past conferences, the meeting will be preceded (Sunday, July 29) by one day of tutorials and a welcome reception. Sessions will take place (Monday-Wednesday, July 30-August 1) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 600+.

Key Deadlines:
Abstract Submission Deadline: February 16, 2018
Author Acceptance Notifications: April 9, 2018
Student Award Applications Deadline: May 1, 2018
Early Registration Deadline: June 1, 2018
Hotel Reservation Deadline: June 26, 2018
JVST Special Issue Deadline: September 5, 2018
ALD Program Chairs
 
Program Chair:
Jin-Seong Park
Hanyang Univ., South Korea

Program Co-Chair:
Hanjin Lim
Samsung Electronics, South Korea

Program Co-Chair: HyunChul Choi
LG Display, South Korea
 
Source: AVS E-mail anouncement
ALE Program Chairs

Program Chair:
Geun Young Yeom
Sungkyunkwan Univ., South Korea

Program Co-Chair:
Ankur Agarwal
KLA-Tencor, USA

Thursday, November 2, 2017

ALD Ireland 2016 co-chairs Simon & Jonas wishing ALD2018 Jin-Seong & Hanjin all the best and a successful conference preparation!

Today Simon and Jonas met in Dresden to catch up and take a selfie with Fraunhofer and at the same time wishing ALD2018 Jin-Seong & Hanjin all the best and a successful conference preparation!
AVS ALD 2018 Incheon, South Korea, ly 29-Wednesday, August 1, 2018: https://ald2018.avs.org/

Monday, October 16, 2017

ALD 2018 July 29-Wednesday, August 1 Incheon, South Korea.

The AVS 18th International Conference on Atomic Layer Deposition (ALD 2018) featuring the 5th International Atomic Layer Etching Workshop (ALE 2018) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching. Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2018 Workshop (ALE 2018), so that attendees can interact freely. The conference will take place Sunday, July 29-Wednesday, August 1, 2018, at the Songdo Convensia in Incheon, South Korea.
 
Link to Conference page: https://ald2018.avs.org/