Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Hurry up ALD & ALE People - These articles on Atomic Layer Processing have been made free to download for a limited time!

Journal of Vacuum Science & Technology A -  First 2016 Issue Online Special Issue on ALD/ALE 2.322  Impact Factor

JVSTA ALD & ALE issue is here!

JVSTA ALD & ALE issue is here - Goldig as they say in German!

Review Articles

Atomic layer deposition on polymer fibers and fabrics for multifunctional and electronic textiles

Alexandra H. Brozena, Christopher J. Oldham and Gregory N. Parsons

J. Vac. Sci. Technol. A 34, 010801 (2016); http://dx.doi.org/10.1116/1.4938104

Prof. Erwin Kessels TU Eindoven is appointed Associate Editor of the JVSTA

Professor W.M.M. (Erwin) Kessels of Eindhoven University of Technology Department of Applied Physics is appointed as an Associate Editor of the Journal of Vacuum Science & Technology(JVSTA). JVSTA has become a very important journal for ALD since it runs a special ALD issue after each International ALD conference. Here is a link to the upcoming issue : http://scitation.aip.org/upload/AVS/JVA/JVST_Special_Issue.pdf

 

 

Congratulations Erwin!

Biography

Erwin Kessels is a full professor at the Department of Applied Physics of the Eindhoven University of Technology TU/e (The Netherlands). He is also the scientific director of the NanoLab@TU/e facilities which provides open-access clean room infrastructure for R&D in nanotechnology. Erwin received his M.Sc. and Ph.D. degree (with highest honors) in Applied Physics from the TU/e in 1996 and 2000, respectively. His doctoral thesis work was partly carried out at the University of California Santa Barbara and as a postdoc he was affiliated to the Colorado State University and Philipps University in Marburg (Germany). In 2007 the American Vacuum Society awarded him the Peter Mark Memorial Award for "pioneering work in the application and development of in situ plasma and surface diagnostics to achieve a molecular understanding of thin film growth". From the Netherlands Organization of Scientific Research, he received a grant in 2010 to set up a large research program on "nanomanufacturing" in order to bridge the gap between nanoscience/nanotechnology and industrial application. His research interests cover the field of synthesis of ultrathin films and nanostructures using methods such as (plasma-enhanced) chemical vapor deposition (CVD) and atomic layer deposition (ALD) for a wide variety of applications, mostly within nanoelectronics and photovoltaics. Within the field of ALD, he has contributed to the field most prominently by his work on plasma-assisted ALD and his research related to ALD for photovoltaics. Erwinchaired the International Conference on Atomic Layer Deposition in 2008 and he has published over 200 papers and holds 2 patents.

ALD Special issue for Novel Nanomaterials and Emerging Applications

Here is a new ALD Special issue for Novel Nanomaterials and Emerging Applications http://www.hindawi.com/journals/jnm/si/289520/cfp/

Atomic Layer Deposition (ALD) has been recognized as a very powerful and elegant tool for nanostructured materials, greatly widening its applications into more and more research areas, ranging from semiconductors to catalysis, optoelectronics, biomedical, gas sensing, resistant coating, clean energies (batteries, fuel cells, supercapacitors, solar cells, etc.), and nano- and microelectromechanical systems (N/MEMS). These are mainly ascribed to the ALD’s unique growth mechanism based on sequentially surface-controlled saturation reactions, consequentially enabling atomic-scale layer-by-layer material growth. As a result, ALD is exclusively capable of constructing both large-scale uniform planar nanofilms and conformal complex nanocoatings at low temperature. ALD’s distinguished characteristics also include superior controllability over material composition and crystallinity.

All the merits make ALD an important technique in seeking new technical solutions and conducting fundamental frontier research. In searching for new energies, for example, ALD enables us to dramatically improve the batteries’ stability, safety, and sustainable high energy by applying subnanoprotective coatings on battery electrodes. ALD has also been reported for cost-effective catalysts, biocompatible devices, superblack light-absorbing materials, solar cell passivation layers, ultralight but ultrastiff mechanical metamaterials, and so on. These new advances witness ever-growing applications of ALD and foresee a new era of ALD. With the increasing importance of ALD as a new nanotechnology route, more research efforts are urgently needed, including new ALD processes based on novel precursors, advanced characterization, novel nanostructures, emerging applications in various areas, and innovations on ALD systems.

The purpose of this special issue is to provide a research forum to exchange the latest outcomes with ALD for nanostructured materials and exploring potentials of ALD-resultant nanomaterials for future applications. This special issue is soliciting original high-quality research work that has not been published or that is not currently under review by other journals or peer-reviewed conferences. The special issue will publish communications, full articles, and review papers.

Potential topics include, but are not limited to:

Novel nanostructured materials by ALD

• Nanofilms, nanoparticles, and nanotubes
• 3D nanostructures
• Nanocomposites

Emerging applications of ALD-induced nanomaterials

• Biomedical and biocompatible coatings
• Clean energies (batteries, fuel cells, solar cells, supercapacitors, etc.)
• Catalysis
• N/MEMS
• Optoelectronics
• Resistant coatings

Authors can submit their manuscripts via the Manuscript Tracking System at http://mts.hindawi.com/submit/journals/jnm/ald/.

Manuscript Due Friday, 29 April 2016

First Round of Reviews Friday, 22 July 2016

Publication Date Friday, 16 September 2016

Lead Guest Editor

Xiangbo Meng, Argonne National Laboratory, Illinois, USA

Guest Editors

Xinwei Wang, Peking University, Shenzhen, China

Dongsheng Geng, Western University, London, Canada

Cagla Ozgit-Akgun, ASELSAN Inc., Ankara, Turkey

Nathanaelle Schneider, IRDEP (EDF/CNRS/Chimie ParisTech), Chatou, France

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Atomic Layer Deposition (ALD) in Energy, Environment, and Sustainability

Figure. Schematic diagram of an ideal surface coating layer on active materials. Image provided by Xueliang Sun.

Guest Editors

Hongjin Fan, Nanyang Technological University, Singapore
Yongfeng Mei, Fudan University, China
Mato Knez, CIC nanoGUNE Research Center, Spain

Scope

The essential characteristics of an atomic layer deposition (ALD) reaction are the sequential self-limiting surface reactions to achieve conformal thin films with sub-monolayer thickness control. This advantage over other deposition processes renders a wide range of applications. While ALD was conventionally applied mainly in semiconductor electronic industry, recently, it is receiving increasing attention for wider applications in energy, environment, and sustainability research, with the advance in recipe development.

This focus collection will centre on the increasing importance of ALD techniques in developing innovative nanoscale materials, processes, devices, and systems relating to energy and environmental applications. Original and Review work detailing the development of energy nanomaterials and devices, including photovoltaics, batteries and supercapacitors, fuel cells, photocatalysts, and photoelectrochemical cells are solicited. Additionally developments in nanophotonics, including applications of ALD in new plasmonics, nanoscale laser, and metamaterials research are included. Interest of this collection also extends to innovations in chemical and biosensing using ALD, for example, organic pollution degradation, surface plasmon sensors, and quantum dot biomarkers.

The scope of this collection includes:

• Fabrication and synthesis
• Energy storage and conversion
• Micro and nano-photonics
• Sensor for environment and healthcare
• Devices integration and reliability

We hope this issue provides a broad overview of the current state and guidance to the future.

Invited reviews

Applications of atomic layer deposition in solar cellsOPEN ACCESSWenbin Niu, Xianglin Li, Siva Krishna Karuturi, Derrick Wenhui Fam, Hongjin Fan, Santosh Shrestha, Lydia Helena Wong and Alfred Iing Yoong Tok2015 Nanotechnology 26 064001

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Elegant design of electrode and electrode/electrolyte interface in lithium-ion batteries by atomic layer depositionJian Liu and Xueliang Sun2015 Nanotechnology 26 024001

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Viewpoints

Towards high-energy and durable lithium-ion batteries via atomic layer deposition: elegantly atomic-scale material design and surface modificationXiangbo Meng2015 Nanotechnology 26 020501

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Papers

The effect of ALD-grown Al2O3 on the refractive index sensitivity of CVD gold-coated optical fiber sensorsDavid J Mandia, Wenjun Zhou, Matthew J Ward, Howie Joress, Jeffrey J Sims, Javier B Giorgi, Jacques Albert and Seán T Barry2015 Nanotechnology 26 434002

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Extremely high efficient nanoreactor with Au@ZnO catalyst for photocatalysisChung-Yi Su, Tung-Han Yang, Vitaly Gurylev, Sheng-Hsin Huang, Jenn-Ming Wu and Tsong-Pyng Perng2015 Nanotechnology 26 394001

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Highly photocatalytic TiO2 interconnected porous powder fabricated by sponge-templated atomic layer depositionShengqiang Pan, Yuting Zhao, Gaoshan Huang, Jiao Wang, Stefan Baunack, Thomas Gemming, Menglin Li, Lirong Zheng, Oliver G Schmidt and Yongfeng Mei2015 Nanotechnology 26 364001

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Control of the initial growth in atomic layer deposition of Pt films by surface pretreatmentJung Joon Pyeon, Cheol Jin Cho, Seung-Hyub Baek, Chong-Yun Kang, Jin-Sang Kim, Doo Seok Jeong and Seong Keun Kim2015 Nanotechnology 26 304003

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Three-dimensional SnO2@TiO2 double-shell nanotubes on carbon cloth as a flexible anode for lithium-ion batteriesHaifeng Zhang, Weina Ren and Chuanwei Cheng2015 Nanotechnology 26 274002

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Deposition of uniform Pt nanoparticles with controllable size on TiO2-based nanowires by atomic layer deposition and their photocatalytic propertiesChih-Chieh Wang, Yang-Chih Hsueh, Chung-Yi Su, Chi-Chung Kei and Tsong-Pyng Perng2015 Nanotechnology 26 254002

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In-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structuresT W Pi, Y H Lin, Y T Fanchiang, T H Chiang, C H Wei, Y C Lin, G K Wertheim, J Kwo and M Hong2015 Nanotechnology 26 164001

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Pd nanoparticles on ZnO-passivated porous carbon by atomic layer deposition: an effective electrochemical catalyst for Li-O2 batteryXiangyi Luo, Mar Piernavieja-Hermida, Jun Lu, Tianpin Wu, Jianguo Wen, Yang Ren, Dean Miller, Zhigang Zak Fang, Yu Lei and Khalil Amine2015 Nanotechnology 26 164003

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Inert ambient annealing effect on MANOS capacitor memory characteristicsNikolaos Nikolaou, Panagiotis Dimitrakis, Pascal Normand, Dimitrios Skarlatos, Konstantinos Giannakopoulos, Konstantina Mergia, Vassilios Ioannou-Sougleridis, Kaupo Kukli, Jaakko Niinistö, Kenichiro Mizohata, Mikko Ritala and Markku Leskelä2015 Nanotechnology 26 134004

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Impact of the atomic layer deposition precursors diffusion on solid-state carbon nanotube based supercapacitors performancesGiuseppe Fiorentino, Sten Vollebregt, F D Tichelaar, Ryoichi Ishihara and Pasqualina M Sarro2015 Nanotechnology 26 064002

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Deposition of ultra thin CuInS2 absorber layers by ALD for thin film solar cells at low temperature (down to 150 °C)Nathanaelle Schneider, Muriel Bouttemy, Pascal Genevée, Daniel Lincot and Frédérique Donsanti2015 Nanotechnology 26 054001

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Photocatalytic activity and photocorrosion of atomic layer deposited ZnO ultrathin films for the degradation of methylene blueYan-Qiang Cao, Jun Chen, Hang Zhou, Lin Zhu, Xin Li, Zheng-Yi Cao, Di Wu and Ai-Dong Li2015 Nanotechnology 26 024002

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Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxideStephan Ratzsch, Ernst-Bernhard Kley, Andreas Tünnermann and Adriana Szeghalmi2015 Nanotechnology 26 024003

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Gas sensing properties and p-type response of ALD TiO2 coated carbon nanotubesCatherine Marichy, Nicola Donato, Mariangela Latino, Marc Georg Willinger, Jean-Philippe Tessonnier, Giovanni Neri and Nicola Pinna2015 Nanotechnology 26 024004

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Air-Stable flexible organic light-emitting diodes enabled by atomic layer depositionYuan-Yu Lin, Yi-Neng Chang, Ming-Hung Tseng, Ching-Chiun Wang and Feng-Yu Tsai2015 Nanotechnology 26 024005

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Atomic-layer-deposition alumina induced carbon on porous NixCo1 − xO nanonets for enhanced pseudocapacitive and Li-ion storage performanceCao Guan, Yadong Wang, Margit Zacharias, John Wang and Hong Jin Fan2015 Nanotechnology 26 014001

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Uniform GaN thin films grown on (100) silicon by remote plasma atomic layer depositionHuan-Yu Shih, Ming-Chih Lin, Liang-Yih Chen and Miin-Jang Chen2015 Nanotechnology 26 014002

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NiO/nanoporous graphene composites with excellent supercapacitive performance produced by atomic layer depositionCaiying Chen, Chaoqiu Chen, Peipei Huang, Feifei Duan, Shichao Zhao, Ping Li, Jinchuan Fan, Weiguo Song and Yong Qin2014 Nanotechnology 25 504001

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Electrochemical synthesis of highly ordered nanowires with a rectangular cross section using an in-plane nanochannel arrayPhilip Sergelius, Josep M Montero Moreno, Wehid Rahimi, Martin Waleczek, Robert Zierold, Detlef Görlitz and Kornelius Nielsch2014 Nanotechnology 25 504002

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Highly ordered and vertically oriented TiO2/Al2O3 nanotube electrodes for application in dye-sensitized solar cellsJae-Yup Kim, Kyeong-Hwan Lee, Junyoung Shin, Sun Ha Park, Jin Soo Kang, Kyu Seok Han, Myung Mo Sung, Nicola Pinna and Yung-Eun Sung2014 Nanotechnology 25 504003

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Distinguishing plasmonic absorption modes by virtue of inversed architectures with tunable atomic-layer-deposited spacer layerYun Zhang, Kenan Zhang, Tianning Zhang, Yan Sun, Xin Chen and Ning Dai2014 Nanotechnology 25 504004

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Cellulose nanofiber-templated three-dimension TiO2 hierarchical nanowire network for photoelectrochemical photoanodeZhaodong Li, Chunhua Yao, Fei Wang, Zhiyong Cai and Xudong Wang2014 Nanotechnology 25 504005

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Spatial resolution in thin film deposition on silicon surfaces by combining silylation and UV/ozonolysisLei Guo and Francisco Zaera2014 Nanotechnology 25 504006

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Atomic layer deposition of lithium phosphates as solid-state electrolytes for all-solid-state microbatteriesBiqiong Wang, Jian Liu, Qian Sun, Ruying Li, Tsun-Kong Sham and Xueliang Sun2014 Nanotechnology 25 504007

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Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteriesS Moitzheim, C S Nimisha, Shaoren Deng, Daire J Cott, C Detavernier and P M Vereecken2014 Nanotechnology 25 504008

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New ALD Book, Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications

Here is a new ALD book edited by Jeannie Valdez Atomic Layer Deposition (ALD): Fundamentals, Characteristics and Industrial Applications to be published by Nova in the 4th quarter 2015.


Editors: Jeannie Valdez
Book Description:
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD. (Imprint: Nova)

Table of Contents:

Preface

Chapter 1
Atomic Layer Deposition for Novel Nonvolatile Memory Devices
(Ai-Dong Li, Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, P. R. China)

Chapter 2
Platinum Nano- Thin Film for Plasmonic Photocatalytic Reaction
(Hung Ji Huang and Bo-Heng Liu, Instrument Technology Research Center, National Applied Research Laboratories, Taiwan)

Chapter 3
Atomic Layer Deposition of Sub-Nano to Nanoscale Surface Coatings for Next-Generation Advanced Battery Systems
(Xiangbo Meng and Jeffrey W. Elam, Energy Systems Division, Argonne National Laboratory, Argonne, Illinois, USA)

Chapter 4
Theoretical Calculation on Mechanism of Thermal and Plasma-Enhanced Atomic Layer Deposition of SiO2
(Guo-Yong Fang, Li-Na Xu and Ai-Dong Li, National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China)

Chapter 5
Fluorine Doping Behavior in Zn-Based Conducting Oxide Film Grown by Atomic Layer Deposition
(Hyung-Ho Park, Young-June Choi and Kyung-Mun Kang, Department of Materials Science and Engineering, Yonsei University, Seoul, Korea)

Index
Series:
Chemical Engineering Methods and Technology
Binding: Hardcover
Pub. Date: 2015 - 4th Quarter
Pages: 7x10 - (NBC-R)
ISBN: 978-1-63483-869-6
Status: AN

JVSTA Most Read Atomic Layer Deposition Articles Published in 2014

Journal of Vacuum Science & Technology A Most Read Atomic Layer Deposition Articles Published in 2014 2.322 Impact  Factor

Visit Online Collection Reactor concepts for atomic layer deposition on agitated particles: A review Delphine Longrie, Davy Deduytsche and Christophe Detavernier J. Vac. Sci. Technol. A 32, 010802 (2014) |  Read More   Roll-to-roll atomic layer deposition process for flexible electronics encapsulation applications Philipp S. Maydannik, Tommi O. Kääriäinen, Kimmo Lahtinen, David C. Cameron, Mikko Söderlund, Pekka Soininen, Petri Johansson, Jurkka Kuusipalo, Lorenza Moro and Xianghui Zeng J. Vac. Sci. Technol. A 32, 051603 (2014)| Read More   Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology Micheal Burke, Alan Blake, Ian M. Povey, Michael Schmidt, Nikolay Petkov, Patrick Carolan and Aidan J. Quinn J. Vac. Sci. Technol. A 32, 031506 (2014) |  Read More   Analytic expressions for atomic layer deposition: Coverage, throughput, and materials utilization in cross-flow, particle coating, and spatial atom ic layer deposition Angel Yanguas-Gil and Jeffrey W. Elam J. Vac. Sci. Technol. A 32, 031504 (2014) |  Read More   Atmospheric pressure spatial atomic layer deposition web coating with in situ monitoring of film thickness Alexander S. Yersak, Yung C. Lee, Joseph A. Spencer and Markus D. Groner J. Vac. Sci. Technol. A 32, 01A130 (2014) |  Read More   In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition Kilian Devloo-Casier, Karl F. Ludwig, Christophe Detavernier and Jolien Dendooven J. Vac. Sci. Technol. A 32, 010801 (2014) | Read More   Capacitance and conductance versus voltage characterization  of Al2O3 layers prepared by plasma enhanced atomic layer deposition at  25° C < T < 200°C Karsten Henkel, Hassan Gargouri, Bernd Gruska, Michael Arens, Massimo Tallarida and Dieter Schmeißer J. Vac. Sci. Technol. A 32, 01A107 (2014) | Read More Hybrid inorganic-organic superlattice structures with atomic layer deposition/molecular layer deposition Tommi Tynell, Hisao Yamauchi and Maarit Karppinen J. Vac. Sci. Technol. A 32, 01A105 (2014)| Read More   Vibration atomic layer deposition for conformal nanoparticle coating Suk Won Park, Jun Woo Kim, Hyung Jong Choi and Joon Hyung Shim J. Vac. Sci. Technol. A 32, 01A115 (2014) |  Read More   Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant Sathees Kannan Selvaraj, Jaya Parulekar and Christos G. Takoudis J. Vac. Sci. Technol. A 32, 010601 (2014)| Read More

JVSTA Issue on ALD Deadline Extended to: Septemeber 5, 2015

Special Issue on Atomic Layer Deposition

JVST A is Soliciting Research Articles for Publication in a Special January/February 2016 Issue on Atomic Layer Deposition Submission Deadline Extended to: Septemeber 5, 2015 This special issue is planned in collaboration with the 15th International Conference on Atomic Layer Deposition (ALD 2015) to be held in Portland, Oregon during June 28-July 1, 2015. The Special Issue will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles are expected to be based on material presented at ALD 2015, research articles that are on ALD but were not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD. Papers will be reviewed using the same criteria as regular JVST articles and must meet JVST standards for both technical content and written English. To be published in JVST, the manuscript must:   (1)   present original findings, conclusions or analysis that have not been published previously (2)   be free of errors and ambiguities, (3)   support conclusions with data and analysis, (4)   written clearly, and (5)   have high impact in its field.

Manuscript Deadline: September 5 , 2015     Click Here to Submit    Article Guidelines & Templates In preparing your article, you should follow the online instructions for contributors. Authors are encouraged to use the JVST templates. The easiest way to prepare your manuscript is to use the available JVST Article Template to delete and replace text as necessary.  This file and the template used to create it are available at the site above.  Online, you will have an opportunity to tell us that your paper is a part of the special issue by choosing "ALD Special Issue." Acceptable manuscript file types are MSWord, LaTeX, and PDF. For the initial submission/review process, a single PDF or MSWord file including the figures is sufficient. However, once a paper is accepted, MSWord or TeX file of the text, any tables and the list of figure captions along with the separate figure files will be required for final production. Use of color in Figures is encouraged. Your FIGURES CAN APPEAR ONLINE IN COLOR FOR FREE. Prepare illustrations in the final published size, not oversized or undersized. For any other details about manuscript preparation, please refer to the JVST A online instructions.