Welcome to the 2nd ALD Fest by ALD Lab Saxony 23rd of May in Dresden

Welcome to the 2nd ALD Fest by ALD Lab Saxony! We are also very happy to announce a new partner Picosun and welcome more insudtry partners to join us!

Agenda of ALD Lab Meeting on Tuesday 23rd of May 2017

Contact: jonas.sundqvist@ikts.fraunhofer.de (Mobile +49 152 0294 3083)

Part 1 - Presentations and discussions 17:00 till 19:00

Place: Fraunhofer IKTS, Winterbergstrasse 28, 01277 Dresden

• Review ALD For Industry, Jonas Sundqvist and Christoph Hossbach 
• Review of Novel High-k Workshop, Uwe Schröder 
• Review von Critical Materials Conference – CMC2017, Dallas 11-12 May, Jonas Sundqvist Feedback and Future of HERALD – The European ALD Network, Marcel Junige

Presentation of new partner

• Picosun presentation – new member, Christoph Hossbach 

Discussion

• Things we are able to offer as a network/division within Cool Silicon e.V.
• Plans for the future and conferences (EuroCVD, ALD2017, EFDS ALD For Industry 2018).

Travel information:
 German: https://www.ikts.fraunhofer.de/de/contact/anfahrtdd.html
 English: https://www.ikts.fraunhofer.de/en/contact/anfahrtdd.html

Part 2 - Joint dinner and networking 19:00 till 23:00

Place: Hotel und Restaurant an der Rennbahn, Winterbergstrasse 96, 01237 Dresden; in walking distance to IKTS

Travel information:
German: http://www.hotel-an-der-rennbahn-dresden.de/lage-anreise/
English: http://www.hotel-an-der-rennbahn-dresden.de/en/lage-anreise/

 

Review of EFDS Workshop – ALD for Industry 2017

In collaboration with the EFDS we organized the workshop “ALD for Industry 2017”. We appreciate to have more than 90 participants and sponsors from all over Europe and North America. There was an diversified programm with representatives from the European and American ALD Equipment Industry : Picosun (FIN), Beneq (FIN), Sentech (GER), FHR Anlagenbau (GER), Encapsulix (FRA), ASM International (NL) and Ultratech CNT (USA).  Further we welcomed representatives from the chemical industry (Air Liquide), customers (Robert Bosch) and research institutions/universities from Germany (Fraunhofer, Leibniz, …) and Finland (Aalto University and VTT Finland) who gave invited and contributed talks.

 

Text and Photos as Posted on 25. January 2017 by Martin Knaut, LINK

 

After half a day of tutorials on ALD thechnology and fundamentals and a nice get-together at the Freiberger Schankhaus in Dresden in the evening, we heard great talks about the broad range of ALD processes, ALD application and ALD equipment in the great ambiance of the Swissôtel Dresden.

Platin Sponsors:

 
 

Gold Sponsors:

Rasirc to present New ALD chemistries for low temperature oxide and nitride films at ALD4Industry

We are very happy to announce that have received a late news abstract from RASIRC out of San Diego, USA, for a presentation to be given at the EFDS Workshop "ALD for Industry" entitled “New ALD chemistries for low temperature oxide and nitride films”. RASIRC is also sponsoring the workshop and will have a stand the the exhibition.

There are still room for some delegates to attend - so please consider to come to Dresden 17-18th of January and participate!

I have met Rasirc many times in Dresden and around the world. Here is a picture from Rasirc sponsoring and presenting the CMC Conference 2016 in Hillsboro USA organized by TECHCET, "Hydrazine as a Low Temperature Nitride Source: Materials Challenges for High Volume Manufacturing " at the event posing Dan Alvarez CTO and Jeff Spiegelman President and Founder.

Link to ALD fro Industry Program HERE

#ALD4Industry (follow in Twitter)

In an European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony is a unique ALD hotspot due to a strong semiconductor and equipment industry.  

 

As you can see we have managed to put together a fantastic program with representatives from the European ALD Equipment Industry : Picosun (FIN), Beneq (FIN), Sentech (GER), FHR Anlagenbau (GER), Encapsulix (FRA), ASM International (NL) and special guests from the USA  - Ultratech CNT! 

 

In addition, representatives from the chemical industry (Air Liquide), customers (Robert Bosch) and research institutions from Germany (Fraunhofer) and Finland (Aalto University and VTT Finland) will make invited and contributing talks. Topics will cover industrialization of ALD beyond the semiconductor industry:

 

▪ MEMS & Sensors ▪ Display ▪ Lightning ▪ Barriers ▪ Photovoltaics

Please visit EFDS for all information for this event and how to register HERE!

Platinum Sponsors:

  

Gold Sponsors:

Welcome to the new web page of ALD Lab Saxony

ALD Lab Saxony is a division of Cool Silicon and combines several universities and resarch institutes to the largest German ALD cluster. Please explore our website to discover the world of Atomic Layer Deposition and to receive informations, news and announcements from the ALD community.

Please have a look on our news blog and our events section for latest information on recent activities and upcoming events.

Program Released - ALD for Industry, EFDS Workshop 17-18 January 2017, Dresden, Germany

Last week we released the program for the tutorials for the  ALD for Industry, EFDS Workshop 17-18 January 2017, Dresden, Germany. Now we are very proud to release the full program for the Workshop the following day!

Link to ALD fro Industry Program HERE

#ALD4Industry (follow in Twitter)

In an European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony is a unique ALD hotspot due to a strong semiconductor and equipment industry. 

As you can see we have managed to put together a fantastic program with representatives from the European ALD Equipment Industry : Picosun (FIN), Beneq (FIN), Sentech (GER), FHR Anlagenbau (GER), Encapsulix (FRA), ASM International (NL) and special guests from the USA  - Ultratech CNT!

In addition, representatives from the chemical industry (Air Liquide), customers (Robert Bosch) and research institutions from Germany (Fraunhofer) and Finland (Aalto University and VTT Finland) will make invited and contributing talks. Topics will cover industrialization of ALD beyond the semiconductor industry:

▪ MEMS & Sensors ▪ Display ▪ Lightning ▪ Barriers ▪ Photovoltaics

Please visit EFDS for all information for this event and how to register HERE!

Workshop - Wednesday, January 18, 2017

09:00 Welcome to ALD for Industry
Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach EFDS & ALD Lab Saxony

09:20 ALD/MLD of flexible inoganic-organic hybrid thin films towards future energy harvesting and storage technologies
Prof. Maarit Karppinen; Department of Chemistry, School of Chemical Technology, Aalto University, Finland

10:00 ALD technology for the continuation of Moore’s law
Dr. Harald Profijt; Corporate R&D, ASM International, Netherlands

10:30 ALD for Life Science Applications
Dr. Ganesh Sundaram; Ultratech, Cambridge Nanotech, USA

10:50 Coffee Break

11:20 Solid precursors for ALD: challenges and opportunities
Dr. Nicolas Blasco; Air Liquide, France

11:40 ALD for optics
Dr. Adriana Szeghalmi; Friedrich-Schiller-Universität Jena, Institute of Applied Physics, Germany

12:00 Opportunities, challenges and solutions for ALD thin-film encapsulation in flexible electronics applications
Dr. Mikko Söderlund; Beneq Oy., Finland

12:20 Lunch Break

13:20 Industrial deployment of nano-engineered ultrabarriers for encapsulation of organic electronics
Dr. Jacques Kools; Encapsulix S.A., France

13:40 ALD applications in MEMS manufacturing
Dr. Florian Schön; Robert Bosch GmbH, Germany

14:00 ALD and 3D coatings
Dr. Tero Pilvi; Picosun Oy., Finland

14:20 Thin films in 3D structures: metrology with microscopic lateral high-aspect-ratio structures
Mikko Utriainen; VTT Technical Research Centre of Finland Ltd., Finland

14:40 Coffee Break

15:00 Where no man has gone before - unique equipment enables unique research
Dr. Hannes Klumbies; FHR Anlagenbau, Germany

15:20 ALD systems for no damage, high uniformity and stability of multilayer deposition
Dr. Hassan Gargouri; SENTECH Instruments GmbH, Germany

15:40 ALD process optimization by equipment simulation
Dr. Jörg Schuster; Fraunhofer ENAS, Germany

16:00 Closing remarks and discussion
Dr. Sven Richter, Dr. Jonas Sundqvist, Dr. Christoph Hossbach
EFDS & ALD Lab Saxony

16:20 End of Workshop Day

 

Final Agenda: ALD Symposium at SEMICON Europa, 25 October 2016

The 5th ALD Symposium at SEMICON Europa will be organized by ALD Lab Saxony, 25th of October in Grenoble France.

The intention of the symposium is to bring together researchers, process developers, tool makers, precursor suppliers and applicants of this exciting technology that can be summarized as Atomic Layer Processing.

Date: 25 October 2016
Time: 9:00–13:00
Location: Le Bans
Web : http://www.semiconeuropa.org/ald-lab

9:00		Welcome Address and Introduction of ALD Lab Saxony Johann W. Bartha, TU Dresden, IHM
9:20		Growth of Ultrathin Cu Films Deposited by Atomic Layer Deposition for BEOL Application Stefan E. Schulz, Fraunhofer ENAS
9:40		Development of Spatial ALD at the LMGP: Application to Transparent Conductive Materials M. David Muñoz-Rojas, LMGP, Grenoble INP
10:00		How Fast Can We Go : Thermal ALD with Millisecond Purge Times Jacques C. S. Kools, Encapsulix SAS
10:20		Atomic Layer Etching Fred Roozeboom, TNO – Solliance, TU Eindhoven
10:40		Break
11:20		Visualization of Nucleation Mechanism During Atomic Layer Deposition with Scanning Probe Techniques Marion Geidel, Johanna Reif, TU Dresden, IHM
11:40		Plasma ALD of Conductive Nitrides and Metals Harm C. M. Knoops, Oxford Instruments
12:00		Novel liquid precursor sources for conformal Ln2O3 ALD and coatings Nicolas Blasco, Air Liquide
12:20		ALD for Optical Applications Tero Pilvi, Picosun Oy
12:40		Closing Address Johann W. Bartha, TU Dresden, IHM