Showing posts with label ALD Lab Saxony. Show all posts
Showing posts with label ALD Lab Saxony. Show all posts

Tuesday, December 4, 2018

The 7th ALD Symposium by ALD Lab Saxony 10th of December 2018 in Dresden

The 7th ALD Symposium will be organized by ALD Lab Saxony and the working group R&D of Silicon Saxony, 10th of December 2018 in Dresden / Germany. 
 

Registration: LINK
 
Location :

Technische Universität Dresden
- Werner-Hartmann-Bau -
Nöthnitzer Str. 66
01187 Dresden 
 
Program 14:00 - 18:00
 
Welcoming
Stefan Uhlig/Cool Silicon

ALD/CVD applications, equipment and precursors in high volume manufacturing
Dr. Jonas Sundqvist/ Fraunhofer IKTS

ALD activities within Research Fab Microelectronics Germany FMD
Bernd Hintze/ Forschungsfabrik Mikroelektronik Deutschland

Atomic layer deposition @ IFW
Andy Thomas/ Leibniz-Institut für Festkörper- und Werkstoffforschung

TSV-Transistor
Felix Winkler/ Technische Universität Dresden, Institut für Halbleiter und Mikrosysteme

BREAK (15:05-15:20)

Synthesis of self-assembled 3D nanostructures using metastable atomic layer deposition
Mario Ziegler/ Leibniz-Institut für Photonische Technologien Jena

ALD layers for reduced wear on micro cutting tools
Toni Junghans/ Westsächsische Hochschule Zwickau

Zr precursor screening for semiconductor applications
Monica Materano/ NamLab

WORLD CAFE (16:00-18:00)
Station 1 – the future of ALX 2019/2020
Station 2 – ALD R&D projects ideas
Station 3 – Internationalisation (players, cooperations, events etc.)

Wrap up world café
Stefan Uhlig/ Cool Silicon

Networking (18:00 - open end): After the official parts, we would be very happy if you accompany us to a trip over the 584. Dresdner Striezelmarkt 2018 and enjoy some networking with a hot cup of delicious mulled wine 


Saturday, January 20, 2018

UPDATE: EFDS ALD for Industry 2018 - Workshop and Tutorial, 21-22 March Dresden, Germany

A topical workshop with focus on industrialization and commercialization of ALD for current and emerging markets

Atomic Layer Deposition (ALD) is used to deposit ultrathin and highly conformal thin films. ALD is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5 - 1.7 billion (2017) and it is expected to double in the next 4- 5 years.

In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony isa unique ALD hotspot due to a strong semiconductor and equipment industry.

Program: LINK

Event page : LINK
The Event will focus on the current markets for ALD, besides the leading edge semiconductor industry, applications in MEMS and Sensors, Display, Lightning, Barriers and Photovoltaics will be addressed.
Presentations and tutorials from: Globalfoundries, University of Helsinki, Air Liquide, Linköping University, Tyndall National Institute, Fraunhofer, TU Dresden, Picosun, Beneq, Veeco CNT, MKS Instruments, Osram Opto, Pegasus Chemicals, Techcet LLC

REGISTRATION OPENS & PROGRAM RELEASE 23 of January 2018!

Registration Fees:

ALD for Industry (Workshop & Tutorial)

Early bird registration (before February 15, 2018): 690,00 EUR
Standard registration: 790,00 EUR
Students: 395,00 EUR

Workshop only

Early bird registration (before February 15, 2018): 490,00 EUR
Standard registration: 590,00 EUR
Students: 290,00 EUR

Tutorial only

Early bird registration (before February 15, 2018): 290,00 EUR
Standard registration: 390,00 EUR
Students: 180,00 EUR

Support:




Wednesday, November 15, 2017

ALD Lab Saxony Symposium at Semicon Europa 2017

The ALD Lab Saxony just held its annual Symposium at SEMICON Europe in Munich, Germany. Prof. Bartha, Dr. Jonas Sundqvist, Dr. Martin Knaut and Dr. Christoph Hossbach have been organizing the event since 2012 in Dresden. This year about 50 persons attended the symposium.

The Intention of the Symposium is to improve visibility of the Atomic Layer Deposition technique and its capabilities and to increase the networking within the ALD community. The given talks gave an overview of current research and development topics as well as examples of ALD applications, equipment, chemical and supply chain in manufacturing. This year’s agenda combined several talks from ALD Lab Saxony members and partners from academia and industry on ALD equipment, applications, metrology as well as ALD simulations. This year the symposium was divided into two sessions: “Equipment and Applications” and “Precursors, Precursor Delivery, Metrology and Simulations”

New exciting applications in the field of MEMS were presented by Fraunhofer ISIT, ALD corrosion protection by Bosch and metal precursor sourcing and supply chain solutions by Umicore to mention a few. The complete Agenda can be found here (LINK: http://www.semiconeuropa.org/ald-lab-symposium-2017) and upon request the presentations will become available.

“Welcome”, Prof. Bartha, TU Dresden (Germany)

“ALD for Production”, Dr. Christoph Hossbach, Picosun (Finland/Germany)

“ALD equipment and precursors for high volume manufacturing”, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany) /TECHCET LLC (USA)


“ALD process monitoring with quartz crystal microbalances”, Dr. Martin Knaut, TU Dresden (Germany)

Thursday, November 2, 2017

UPDATE: ALD Lab Saxony Symposium at SEMICON EUROPA

The ALD Lab Saxony Symposium is a yearly side event of the SEMICON Europe organized since 2012. The Symposium is intended to improve visibility of the Atomic Layer Deposition technique and to promote networking between academics, institutes and industry. The symposium gives an overview of various research and development topics as well as examples of ALD applications in R&D and manufacturing. 
 

Date: 14.11.2017
Place: SEMICON Europa, Conference Room A12

SESSION 1 – EQUIPMENT AND APPLICATIONS

10:00 Welcome, Prof. Bartha, TU Dresden (Germany)
10:20 ALD for Production, Dr. Christoph Hossbach, Picosun (Finland/Germany)
10:40 Fabrication of 3D microstructures from micron-sized powder using ALD and possible applications for MEMS”, Dr. Thomas Lisec, Fraunhofer ISIT (Germany)
11:00 ALD Coatings on Steel: Defect Density and Corrosion Protection, Tim Poljanšek, Robert Bosch GmbH (German)
11:20 Passivation, Capacitors or 3D-Structures – Outline the Possibilities of ALD, Dr. Dorothee Dietz, Fraunhofer IMS (Germany)
11:40 Antireflection Coatings by Atomic Layer Deposition, Dr. Kristin Pfeiffer, Fraunhofer IOF (Germany)

12:00 Lunch and Networking 

Vorspeisen: 
Salat Antipasti, Austernpilzen, Ruccolapesto, Chiabattabrot, Tomaten, Mozzarella, Balsamico und Basilicum

Haptgänge: 
- Meditiraner Kalbstafelspitz, Gemüse der Saison und Kartoffelgratin
- Tortellini Ricotta Spinat, Salbeibutter und Parmesan mit Mozarella

Dessert:
Panna Cotta, Schwarz-weiß und Fruchtspiegel

SESSION 2 – PRECURSORS, PRECURSOR DELIVERY, METROLOGY AND SIMULATIONS

13:00 ALD equipment and precursors for high volume manufacturing, Dr. Jonas Sundqvist, Fraunhofer IKTS (Germany)
13:20 Precursor supply chain support, Dr. Simon Rushworth, EpiValence (UK)
13:40 Electronics: a key market for Umicore – a key partner for the market,  Dr. Oliver Briel, Umicore (Germany)
14:00 Precursor systems delivery for ALD, n.n., SEMPA Systems GmbH (Germany)
14:20 ALD process monitoring with quartz crystal microbalances,  Dr. Martin Knaut, TU Dresden (Germany)
14:40 Title to be given, n.n., Veeco CNT (USA)
15:00 ALD process optimization using computational fluid dynamics,  Linda Jäckel, Fraunhofer ENAS (Germany) 
 
The syposium is organized and facilitated by:
 
ALD Lab Saxony: IHM TU-Dresden & Fraunhofer IKTS and BALD Enginering

Wednesday, October 18, 2017

ALD FOR INDUSTRY, MARCH 21 – 22, 2018 – DRESDEN:

ALD FOR INDUSTRY, MARCH 21 – 22, 2018 – DRESDEN: Following the succes of ALD for Industry 2017 with 100 participants we will continue to organize this event. This time we have extended the Workshop with half a day to a full 2 day event and the ALD Exhhibition will also be open for the public! In addition, the part of the workshop will be a HERALD Event so please contact us for more details on that.

Conference Chairs: Jonas Sundqvist, Fraunhofer IKTS and Christoph Hossbach, Picosun Germany
Tutorial Chair: Colin Georgi, Fraunhofer ENAS

Committee: Bernd Hintze (invited speaker), Globalfoundries and Henry Bernhardt, Infineon


Background: A topical workshop with focus on industrialization and commercialization of ALD for current and emerging markets Atomic Layer Deposition (ALD) is used to deposit ultrathin and highly conformal thin films. ALD is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. 

ALD in Germany: According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5 - 1.7 billion (2017) and it is expected to double in the next 4- 5 years. In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony isa unique ALD hotspot due to a strong semiconductor and equipment industry.

The Event will focus on the current markets for ALD, besides the leading edge semiconductor industry, applications in MEMS and Sensors, Display, Lightning, Barriers and Photovoltaics will be addressed.

 
Sponsors (signed so far):

CONTACT:
Dr. Katrin Ferse
Europäische Forschungsgesellschaft Dünne Schichten e. V.
Gostritzer Str. 63, 01217 Dresden, Tel. +49 351 871 8374, Fax: +49 351 8718431
E-Mail: ferse@efds.org, web: www.efds.org
 
Dr. Jonas Sundqvist 

Fraunhofer IKTS, Dünnschicht-Technologien | Thin-Film Technologies, Winterbergstraße 28, 01277 Dresden, Germany
Telefon +49 351 2553 7693, Mobile +49 173 4394 239
E-Mail: jonas.sundqvist@ikts.fraunhofer.de
www.ikts.fraunhofer.de

 

Thursday, August 31, 2017

The 6th ALD Lab Saxony Symposium at the SEMICON Europa 2017 in Munich, Germany

As usual ALD Lab Saxony is organizing an ALD Symposium at SEMICON Europa. This time we are back in Munich and for the first time co-located with Productronica which may open new exsiting oppertunities for ALD!

Confirmed speakers from: Picosun Oy, Fraunhofer IMS Fraunhofer IKTS, and TECHCET LLC

More iformation will be available momentairly and the event is open for sponsoring

Please contact Jonas Sundqvist for more information: jonas.sundqvist@ikts.fraunhofer.de




Friday, June 16, 2017

ALD Lab Saxony, Cool Silicon e.v. participation and Exhibition at EuroCVD-Baltic ALD 2017 in Linköping, Sweden


ALD Lab Saxony  participated in the EuroCVD-Baltic ALD 2017 Conference in Linköping, Sweden 11th to 14th of June 2017. The ALD Lab Saxony members (IHM, TU Dresden), Fraunhofer ENAS and Fraunhofer IKTS) gave presentations and posters in the following fields:
  • Precursors (design, synthesis and delivery)
  • Process Equipment (reactors)
  • Nanomaterials (particles, 2D-materials, nano structures)
  • In-situ monitoring (QCM, Ellipsometry, IR, syncrotron)
  • Nitrides (semiconductors, conductors, hard coatings)
  • Carbides (hard coatings, semiconductors)
  • Elemental films (metals, amorphous carbon)
  • Emerging materials (hybrid MLD/ALD, sulfides)
ALD Lab Saxony also took active part in the exhibition with a joint table together with Colnatec the QCM Sensor company from Arizona USA and PillarHall(TM) team from VTT Finland presenting silicon wafers and chips that enable easy analysis of thin film conformality using well-defined, record-demanding microscopic 3-D structures.


Christoph Hossbach, now at Picosun Germany (a member of ALD Lab Saxony) taking the grand stage presenting on Area Selective ALD (Photo credit: Professor Henrik Pedersen, Twitter)




Marcel Junige (TU Dresden) presenting a poster on ALD Gold precursor candidates (photo credit: Marcel Junige)

 

Joint exhibition table with Colnatec USA (Wendy Jameson) and VTT Finland (Photo credit: Colin Georgi)



Fraunhofer IKTS (Jonas Sundqvist) presented via video link the latest developments on Hard coatings by CVD and ALD on WC Powder (Photo Credit Jonas Sundqvist)